AG ALLOY SPUTTERING TARGET - MITSUBISHI MATERIALS CORP

Title:

AG ALLOY SPUTTERING TARGET

Document Type and Number:

WIPO Patent Application WO/2021/240839

Kind Code:

A1

Abstract:

This Ag alloy sputtering target comprises an Ag alloy that includes Ge and In, and the crystallite diameter thereof as derived by the Scherrer equation is 220 Å or less. The Ag alloy preferably has a composition containing In in a range of 0.1-1.5 mass% (inclusive) and Ge in a range of 0.1-7.5 mass% (inclusive), the balance being Ag and unavoidable impurities.

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Inventors:

HAYASHI YUJIRO (JP)
KOMIYAMA SHOZO (JP)

Application Number:

PCT/JP2020/039705

Publication Date:

December 02, 2021

Filing Date:

October 22, 2020

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Assignee:

MITSUBISHI MATERIALS CORP (JP)

International Classes:

C23C14/34; C22C5/06; C22F1/00; C22F1/14

Domestic Patent References:

WO2007114439A1

2007-10-11

Foreign References:

JP2019143242A	2019-08-29
JPH11339568A	1999-12-10

Attorney, Agent or Firm:

MATSUNUMA Yasushi et al. (JP)

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