Title:
AIR CURRENT STERILIZATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/024070
Kind Code:
A1
Abstract:
Provided is an air current sterilization device 1A that comprises: a cylindrical sterilization section 3 that comprises a sterilization chamber 35 that extends in a primary axial direction; a linear light-emitting element 5 that can radiate ultraviolet light toward an air current flowing through the sterilization chamber and that has a uniform ultraviolet radiation intensity; an air inflow section 2 through which air (air) is allowed to flow into the sterilization chamber; and an air outflow section 4 through which the air (air) is allowed to flow out from the sterilization chamber. The air inflow section 2 comprises a plurality of void layers 21 that are formed in layers and that have, as principal components, a plurality of vertical void layers 21a that are coaxially circular, and bottom-edge void layers 21b that communicate respectively with the vertical void layers and spread in a secondary axial direction. The plurality of void layers 21 are configured so that the air in the bottom-edge void layers 21b flows through the vertical void layers 21a and into the sterilization chamber 35 at a constant velocity. Thereby, the present invention makes it possible to provide an air current sterilization device that has high sterilization efficiency, and a compact and simple structure.
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Inventors:
KAWAMURA HIROSHI (JP)
ADACHI HIROYUKI (JP)
ADACHI HIROYUKI (JP)
Application Number:
PCT/JP2022/029226
Publication Date:
February 01, 2024
Filing Date:
July 29, 2022
Export Citation:
Assignee:
AM SYSTEMS CO LTD (JP)
International Classes:
A61L9/20; A61L2/10
Domestic Patent References:
| WO2021235449A1 | 2021-11-25 | |||
| WO2011087100A1 | 2011-07-21 |
Foreign References:
| JP2007502200A | 2007-02-08 | |||
| CN203694182U | 2014-07-09 | |||
| JP2021028056A | 2021-02-25 | |||
| JP2019188127A | 2019-10-31 | |||
| JPH0455353U | 1992-05-12 | |||
| JP2009195369A | 2009-09-03 |
Attorney, Agent or Firm:
MEBUKI IP LAW FIRM et al. (JP)
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