ALICYCLIC COMPOUND, METHOD FOR MANUFACTURING SAME, COMPOSITION CONTAINING SAME AND RESIST PATTERN FORMATION METHOD USING SAME

Title:

ALICYCLIC COMPOUND, METHOD FOR MANUFACTURING SAME, COMPOSITION CONTAINING SAME AND RESIST PATTERN FORMATION METHOD USING SAME

Document Type and Number:

WIPO Patent Application WO/2010/087339

Kind Code:

A1

Abstract:

Disclosed are an alicyclic compound in which a cholic acid ester structure-containing group is bound to an adamantane skeleton, method for manufacturing the same, composition containing the same, and resist pattern formation method using the same, that provide an alicyclic compound which has superior solvent properties, light exposure sensitivity, resolution, roughness, and heat resistance, etc., and especially excellent dissolution inhibiting effect against development fluids, and is useful as a positive photoresist monomer or dissolution inhibitor used in semiconductor device fabrication, and that provide a method for manufacturing the same, composition containing the same, and resist pattern formation method using the same.

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Inventors:

TANAKA SHINJI (JP)
MURAKAMI MIKI (JP)
FUKUSHIMA KAZUYA (JP)
KAWANO NAOYA (JP)

Application Number:

PCT/JP2010/050977

Publication Date:

August 05, 2010

Filing Date:

January 26, 2010

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Assignee:

IDEMITSU KOSAN CO (JP)
TANAKA SHINJI (JP)
MURAKAMI MIKI (JP)
FUKUSHIMA KAZUYA (JP)
KAWANO NAOYA (JP)

International Classes:

C07J9/00; G03F7/004; G03F7/039; C09D199/00

Domestic Patent References:

WO2007094784A1

2007-08-23

Foreign References:

JP2007193328A	2007-08-02
JP2007316508A	2007-12-06
JP2006003781A	2006-01-05
JP2009265623A	2009-11-12

Other References:

TANAKA, S. ET AL., PROC. OF SPIE, vol. 6153, no. 61532B, 2006, pages 1 - 12
TANAKA, S. ET AL., PROC. OF SPIE, vol. 6923, no. 69231J, 2008, pages 1 - 8
KIM. J. B., PROCEEDINGS OF SPIE, vol. 5753, 2005, pages 603 - 610

Attorney, Agent or Firm:

OHTANI, Tamotsu et al. (JP)
Tamotsu Otani (JP)

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