Title:
ALICYCLIC COMPOUND, PRODUCTION METHOD THEREFOR, COMPOSITE CONTAINING SAID COMPOUND, AND RESIST PATTERN FORMING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2010/146901
Kind Code:
A1
Abstract:
Provided is an alicyclic compound wherein one or two groups that contain cholic acid ester structures are bonded to an adamantane skeleton. Said alicyclic compound is useful as a dissolution inhibitor, a positive photoresist monomer used in semiconductor device manufacturing, or the like, and has excellent solubility properties, exposure sensitivity, resolution, roughness, heat-resistance, and the like, and in particular exhibits excellent dissolution inhibition with respect to developing solution. Also provided are a method for producing the aforementioned alicyclic compound, a composite containing the alicyclic compound, and a resist pattern forming method using same.
Inventors:
MURAKAMI MIKI (JP)
TANAKA SHINJI (JP)
KAWANO NAOYA (JP)
TANAKA SHINJI (JP)
KAWANO NAOYA (JP)
Application Number:
PCT/JP2010/054240
Publication Date:
December 23, 2010
Filing Date:
March 12, 2010
Export Citation:
Assignee:
IDEMITSU KOSAN CO (JP)
MURAKAMI MIKI (JP)
TANAKA SHINJI (JP)
KAWANO NAOYA (JP)
MURAKAMI MIKI (JP)
TANAKA SHINJI (JP)
KAWANO NAOYA (JP)
International Classes:
C07J9/00; G03F7/004; G03F7/039
Domestic Patent References:
| WO2007094784A1 | 2007-08-23 |
Foreign References:
| JP2007193328A | 2007-08-02 | |||
| JP2006003781A | 2006-01-05 | |||
| JP2009265623A | 2009-11-12 |
Other References:
TANAKA, S. ET AL.: "Adamantane Based Molecular Glass Resist for 193nm Lithography", PROC. OF SPIE, vol. 6153, no. 61532B, 2006, pages 1 - 12
Attorney, Agent or Firm:
OHTANI, Tamotsu et al. (JP)
Tamotsu Otani (JP)
Tamotsu Otani (JP)
Download PDF: