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Title:
ALIGNMENT MARK, MASK, AND DISPLAY SUBSTRATE MASTER
Document Type and Number:
WIPO Patent Application WO/2021/102934
Kind Code:
A1
Abstract:
An alignment mark comprising a first alignment identifier located on a first face of a substrate; and a second alignment identifier located on a second face of the substrate. The second alignment identifier is matched with the first alignment identifier. The second alignment identifier can characterize the process deviation between the second alignment identifier and the first alignment identifier.

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Inventors:
XIAO LI (CN)
ZHAO JIAO (CN)
LIU DONGNI (CN)
XUAN MINGHUA (CN)
ZHENG HAOLIANG (CN)
CHEN LIANG (CN)
CHEN HAO (CN)
ZHANG ZHENYU (CN)
LIU JING (CN)
QI QI (CN)
Application Number:
PCT/CN2019/122047
Publication Date:
June 03, 2021
Filing Date:
November 29, 2019
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
International Classes:
G03F9/00; G03F1/42
Foreign References:
CN103698934A2014-04-02
CN104078446A2014-10-01
US20070170603A12007-07-26
CN106773525A2017-05-31
CN110071093A2019-07-30
US20100301500A12010-12-02
CN102650819A2012-08-29
Other References:
See also references of EP 4067995A4
Attorney, Agent or Firm:
BEIJING ZBSD PATENT&TRADEMARK AGENT LTD. (CN)
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