AMORPHOUS, FINE SILICA PARTICLES, AND METHOD FOR THEIR PRODUCTION AND THEIR USE

Title:

AMORPHOUS, FINE SILICA PARTICLES, AND METHOD FOR THEIR PRODUCTION AND THEIR USE

Document Type and Number:

WIPO Patent Application WO/2001/098211

Kind Code:

A1

Abstract:

Amorphous silica particles produced by flame hydrolysis of a silicon compound, which has an average median diameter of 0.1 to 0.7 $g(m)m, a BET specific surface area of 5 to 30 m?2¿/g, a dispersion coefficient of 40 or less and an absolute value of frictional electrification charge of 20 $g(m)C/m?2¿ or more; and a method for producing such silica particles which comprises introducing a gaseous silicon compound into a flame having a temperature not lower than the melting point of silica at an increased concentration of silica and growing the generated silica particles in this flame with a short residence time. The silica particles have a shape near to the true sphere and has a very narrow diameter distribution and thus suitable as a filler for a semiconductor sealant and other various materials, and further is suitably used as an external or internal additive for an elctrophotographic toner, a sensitive material and a charge transferring layer material for elctrophotography and the like due to its great capability of being electrified.

Inventors:

SHIBASAKI TAKEYOSHI (JP)
HONDA KAZUYOSHI (JP)
MUROTA MASAMICHI (JP)
SHIRONO HIROKUNI (JP)

Application Number:

PCT/JP2001/005252

Publication Date:

December 27, 2001

Filing Date:

June 20, 2001

Export Citation:

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Assignee:

NIPPON AEROSIL CO LTD (JP)
SHIBASAKI TAKEYOSHI (JP)
HONDA KAZUYOSHI (JP)
MUROTA MASAMICHI (JP)
SHIRONO HIROKUNI (JP)

International Classes:

C01B33/18; C09C1/30; G03G5/05; G03G5/147; G03G9/097; (IPC1-7): C01B33/18; C08K3/36; C09C1/30; C09C3/12

Foreign References:

JP2000258947A	2000-09-22
JPH02188421A	1990-07-24
JPH1045974A	1998-02-17
JPH07261417A	1995-10-13

Other References: