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Title:
AMORPHOUS SILICA PARTICLE DISPERSION AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2024/043115
Kind Code:
A1
Abstract:
The purpose is to provide disk-shaped amorphous silica particles having excellent dispersibility. The purpose is to provide a silica particle dispersion containing disk-shaped amorphous silica particles by using a complex of quaternary ammonium and silicic acid formed in a hydrophilic solvent at an alkaline pH without going through delamination treatment which makes it difficult to obtain uniform single-layer exfoliated particles, and a method for producing the same. The above purposes are achieved by the following silica particle dispersion: Disk-shaped amorphous silica particles having an average diameter of 30-1000 nm inclusive and an average thickness of 0.1-3 nm inclusive. A silica particle dispersion containing disk-shaped amorphous silica particles; quaternary ammonium represented by formula (1): in formula (1), substituents R1 to R4 each independently represent a C1-16 alkyl group; and an anion.

Inventors:
SHIMOJIMA ATSUSHI (JP)
FUJINO KOKI (JP)
YATOMI MASASHI (JP)
HATTORI TETSUYA (JP)
TAKAKUMA NORIYUKI (JP)
FUKUOKA TAKUYA (JP)
LIU JIAHAO (JP)
Application Number:
PCT/JP2023/029224
Publication Date:
February 29, 2024
Filing Date:
August 10, 2023
Export Citation:
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Assignee:
UNIV WASEDA (JP)
NISSAN CHEMICAL CORP (JP)
International Classes:
C01B33/18; C01B33/141; C09C1/28; C09D17/00
Domestic Patent References:
WO2013039212A12013-03-21
Foreign References:
JP2010184856A2010-08-26
JP2009149493A2009-07-09
Attorney, Agent or Firm:
ASAMURA IP P.C. (JP)
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