Title:
ANTI-REFLECTION FILM
Document Type and Number:
WIPO Patent Application WO/2019/031325
Kind Code:
A1
Abstract:
Provided is an anti-reflection film which has exceptional reflective properties (low reflective properties) in a broad spectrum and in which coloration is suppressed. This anti-reflection film has: a transparent substrate; and, in the following order from the transparent substrate, an adhesion layer, a first Nb2O5 layer, a first SiO2 layer, a second Nb2O5 layer, and a second SiO2 layer; the optical film thickness of the first Nb2O5 layer being 28-33 nm, the optical film thickness of the first SiO2 layer being 46-59 nm, the optical thickness of the second Nb2O5 layer being 262-286 nm, and the optical film thickness of the second SiO2 layer being 122-135 nm.
Inventors:
KANATANI MINORU (JP)
NASHIKI TOMOTAKE (JP)
TAKAMI YOSHIHITO (JP)
NASHIKI TOMOTAKE (JP)
TAKAMI YOSHIHITO (JP)
Application Number:
PCT/JP2018/028779
Publication Date:
February 14, 2019
Filing Date:
August 01, 2018
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
International Classes:
G02B1/115; B32B7/02; B32B9/00; C23C14/06; G02B1/14; G02B1/18; G09F9/00
Domestic Patent References:
| WO2002077704A1 | 2002-10-03 | |||
| WO2016181983A1 | 2016-11-17 | |||
| WO2018038114A1 | 2018-03-01 |
Foreign References:
| JP2009084143A | 2009-04-23 | |||
| JP2003043208A | 2003-02-13 | |||
| JP2017068096A | 2017-04-06 |
Attorney, Agent or Firm:
MOMII Takafumi (JP)
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