Title:
ANTISTATIC RESIN COMPOSITION AND KIT FOR PREPARATION OF ANTISTATIC RESIN VESSEL
Document Type and Number:
WIPO Patent Application WO/2006/117933
Kind Code:
A1
Abstract:
This invention provides an antistatic resin composition comprising (a) 100 parts by weight of a polyacrylonitrile resin and, blended with the polyacrylonitrile resin, (b) 3 to 10 parts by weight of a graft copolymer prepared by graft polymerizing an ethylenically unsaturated monomer onto an alkylene oxide group-containing rubbery stem polymer, (c) 3 to 10 parts by weight of a hydrophilic polymer compatible with a polyacrylonitrile resin (a), and (d) 0.01 to 5 parts by weight of a surfactant. This composition is suitable for the formation of a vessel suitable for storing precision products, which are produced in a very small amount but are required to have high antistatic properties, such as photomasks, or semi-finished products thereof. There is also provided a kit for the preparation of an antistatic resin vessel comprising the antistatic resin composition and acetonitrile as a solvent.
Inventors:
ARAI SHIRO
Application Number:
PCT/JP2006/305222
Publication Date:
November 09, 2006
Filing Date:
March 16, 2006
Export Citation:
Assignee:
KUREHA CORP (JP)
ARAI SHIRO
ARAI SHIRO
International Classes:
C08L33/20; B65D85/86; C08L51/04; C08L77/00
Foreign References:
| JP2002309097A | 2002-10-23 | |||
| JPS592462B2 | 1984-01-18 | |||
| JPH06342187A | 1994-12-13 | |||
| JPH10112302A | 1998-04-28 |
Attorney, Agent or Firm:
Endo, Yukio (MiyataBuilding 17-16 Nishi-Shimbashi 1-Chom, Minato-Ku Tokyo 03, JP)
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