APPARATUS FOR CATALYTIC CHEMICAL VAPOR DEPOSITION

WIPO Patent Application WO/2007/148457

A1

[PROBLEMS] An apparatus for catalytic chemical vapor deposition (Cat-CVD apparatus) in which a feed gas is decomposed by contact with a heated catalyst structure and a decomposition species generated by the decomposition or a species newly generated from the decomposition species is transported to a substrate to deposit a thin film on the substrate. That part of the catalyst structure which has a lower temperature than the other parts is inhibited from suffering a catalyst structure surface alteration attributable to the low temperature, such as silicidation. [MEANS FOR SOLVING PROBLEMS] In the Cat-CVD apparatus, only that part of the catalyst structure which has a lower temperature than the other parts has, disposed in at least the surface of the catalyst structure, a compound or mixture preventing that low-temperature part from undergoing an alteration which is different from that occurring in the other parts of the catalyst structure and is caused by the temperature decrease in that low-temperature part.

MATSUMURA HIDEKI (JP)
OHDAIRA KEISUKE (JP)
HONDA KAZUHIRO (JP)

PCT/JP2007/055838

December 27, 2007

March 22, 2007

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JAPAN ADV INST SCIENCE & TECH (JP)
MATSUMURA HIDEKI (JP)
OHDAIRA KEISUKE (JP)
HONDA KAZUHIRO (JP)

C23C16/44; B01J23/30; B01J33/00

JP2001358077A	2001-12-26
JP2004091836A	2004-03-25

HONDA K. ET AL.: "Cat-CVD-ho ni okeru Tungsten Shokubaitai no Silicide-ka no Yokusei", DAI 53 KAI OYO BUTSURIGAKU KANKEI RENGO KOENKAI KOEN YOKOSHU, 22 March 2006 (2006-03-22), pages 966 BSTR. NO. 23A-Y-4, XP003024519

SUZUKI, Shoji et al. (9th Fl. 10-3, Shinjuku 1-chom, Shinjuku-ku Tokyo 22, JP)

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