APPARATUS FOR CHARGED-PARTICLE BEAM IRRADIATION, AND METHOD OF CONTROL THEREOF

Title:

APPARATUS FOR CHARGED-PARTICLE BEAM IRRADIATION, AND METHOD OF CONTROL THEREOF

Document Type and Number:

WIPO Patent Application WO/2001/024591

Kind Code:

A1

Abstract:

A power supply for applying voltage to a scanning electromagnet for deflecting a charged particle beam comprises a first power supply section without a filter and a second power supply section with a filter. When the spot of the charged particle beam is moved on an object of irradiation, the first power supply section without a filter, i.e., without a delay element, applies the voltage to the scanning electromagnet so that the excitation current flowing to the scanning electromagnet can be instantaneously changed. When the spot of the charged particle beam is maintained at a position on the object, the second power supply section with the filter applies voltage without ripples to the scanning electromagnet so that the excitation current flowing to the scanning electromagnet can be controlled accurately. As a result, an object can be irradiated with a charged particle beam uniformly in a short time.

Inventors:

AKIYAMA HIROSHI (JP)
KUBO HIROSHI (JP)
HIRAMOTO KAZUO (JP)

Application Number:

PCT/JP1999/005250

Publication Date:

April 05, 2001

Filing Date:

September 27, 1999

Export Citation:

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Assignee:

HITACHI LTD (JP)
AKIYAMA HIROSHI (JP)
KUBO HIROSHI (JP)
HIRAMOTO KAZUO (JP)

International Classes:

A61N5/10; G01Q60/50; G09G3/10; G21K1/08; G21K1/093; G21K5/00; H01J7/28; H05H7/04; G01Q10/00; G01Q60/00; (IPC1-7): H05H3/04

Foreign References:

JPH06112000A	1994-04-22
JPH0888972A	1996-04-02

Other References: