Title:
APPARATUS FOR FORMING ORGANIC THIN FILM
Document Type and Number:
WIPO Patent Application WO/2012/077590
Kind Code:
A1
Abstract:
[Problem] To provide an apparatus for forming an organic thin film, wherein an organic thin film deposited on the surface of a deposition prevention plate can be easily removed.
[Solution] An apparatus for forming an organic thin film, which comprises: a vacuum chamber; a substrate stage that is arranged within the vacuum chamber; a gas supply unit for supplying an organic material gas into the vacuum chamber through a supply port that is exposed to the inside of the vacuum chamber; and a deposition prevention plate that is fitted to the inner wall surface of the vacuum chamber. The apparatus for forming an organic thin film forms an organic thin film from the organic material gas on the substrate that is arranged on the surface of the substrate stage. A fluororesin-containing electroless nickel film that contains a polytetrafluoroethylene at a volume ratio of 20-40% (inclusive) relative to the volume of the entire film is formed on the exposed surface of the deposition prevention plate. Since the fluororesin-containing electroless nickel film has releasability with respect to organic thin films, even if an organic film is deposited thereon, the organic thin film can be easily removed by high-pressure washing or the like.
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Inventors:
OMORI DAISUKE (JP)
UCHIDA KAZUYA (JP)
MIYAUCHI JUN (JP)
UCHIDA KAZUYA (JP)
MIYAUCHI JUN (JP)
Application Number:
PCT/JP2011/077898
Publication Date:
June 14, 2012
Filing Date:
December 02, 2011
Export Citation:
Assignee:
ULVAC INC (JP)
OMORI DAISUKE (JP)
UCHIDA KAZUYA (JP)
MIYAUCHI JUN (JP)
OMORI DAISUKE (JP)
UCHIDA KAZUYA (JP)
MIYAUCHI JUN (JP)
International Classes:
C23C14/00; C23C14/12
Foreign References:
| JPH04236759A | 1992-08-25 | |||
| JP2010024494A | 2010-02-04 |
Attorney, Agent or Firm:
ISHIJIMA, Shigeo et al. (JP)
Shigeo Ishijima (JP)
Shigeo Ishijima (JP)
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Claims: