Title:
APPARATUS FOR AND METHOD OF CONTINUOUS HTS TAPE BUFFER LAYER DEPOSITION USING LARGE SCALE ION BEAM ASSISTED DEPOSITION
Document Type and Number:
WIPO Patent Application WO2005006351
Kind Code:
A3
Abstract:
The present invention is a high-throughput ion beam assisted deposition (EBAD) system and method of utilizing such a system that enables continuous deposition of thin films such as the buffer layers of HTS tapes. The present invention includes a spool-to-spool feed system that translates a metal substrate tape through the EBAD system as the desired buffer layers are deposited atop the translating substrate tape using an e-beam evaporator assisted by an ion beam. The system further includes a control and monitor system to monitor and regulate all necessary system parameters. The present invention facilitates deposition of a high-quality film over a large area of translating substrate.
Inventors:
SELVAMANICKAM VENKAT
SATHIRAJU SRINIVAS
SATHIRAJU SRINIVAS
Application Number:
PCT/US2004/016637
Publication Date:
June 30, 2005
Filing Date:
May 25, 2004
Export Citation:
Assignee:
SUPERPOWER INC (US)
International Classes:
C23C14/08; C23C14/54; C23C14/56; (IPC1-7): C23C16/00
Foreign References:
US6045864A | 2000-04-04 | |||
US5470668A | 1995-11-28 | |||
US5993622A | 1999-11-30 | |||
US4506453A | 1985-03-26 | |||
US5076203A | 1991-12-31 |
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