Title:
APPARATUS AND METHOD FOR GENERATING ATMOSPHERIC-PRESSURE PLASMA
Document Type and Number:
WIPO Patent Application WO/2007/129520
Kind Code:
A1
Abstract:
An apparatus for generating atmospheric-pressure plasma is provided with substrates
(2, 22); antennas (3, 17, 26, 38) arranged on the substrates (2, 22); discharge
tubes (4, 18, 28, 37) arranged in the vicinity of the antennas (3, 17, 26, 38); a
high-frequency power supply (8) for supplying VHF-band high-frequency power
to the antennas (3, 17, 26, 38); and a matching circuit (7) which inputs high frequency
from the high-frequency power supply (8) and adjusts the reflection waves. A
phase circuit (6) is connected between the matching circuit (7) and the antennas
(3, 17, 26, 38). The circuit constant of the phase circuit (6) is so set as to have
a position, at which the current amplitude of a standing wave is maximum, or a position,
at which the voltage amplitude of the standing wave is minimum, in the vicinity
of the antennas (3, 17, 26, 38).
More Like This:
| JP2006172943 | PLASMA TREATMENT APPARATUS |
| WO/2017/098987 | PLASMA REACTOR AND CLAMP FOR LAMINATED BODY |
| WO/2021/230519 | PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND ASSEMBLY METHOD THEREFOR |
Inventors:
MATSUMORI MASASHI
NAKATSUKA SHIGEKI
ICHIKI TAKANORI
NAKATSUKA SHIGEKI
ICHIKI TAKANORI
Application Number:
PCT/JP2007/057767
Publication Date:
November 15, 2007
Filing Date:
April 06, 2007
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD (JP)
MATSUMORI MASASHI
NAKATSUKA SHIGEKI
ICHIKI TAKANORI
MATSUMORI MASASHI
NAKATSUKA SHIGEKI
ICHIKI TAKANORI
International Classes:
H05H1/24; H01L21/205; H01L21/3065; B23K10/00; G01N37/00
Foreign References:
| JP2005267975A | 2005-09-29 | |||
| JP2002260899A | 2002-09-13 | |||
| JP2002373883A | 2002-12-26 |
Other References:
ICHIKI T. ET AL.: "An atmospheric-pressure microplasma jet source for the optical emission spectroscopic analysis of liquid sample", PLASMA SOURCES SCI. TECHNOL., 2003, pages S17 - S20, XP020070096
YU YIN ET AL.: "Miniaturization of Inductively Coupled Plasma Sources", IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, pages 1516 - 1524, XP003016977
YU YIN ET AL.: "Miniaturization of Inductively Coupled Plasma Sources", IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, pages 1516 - 1524, XP003016977
Attorney, Agent or Firm:
ISHIHARA, Masaru (Tatsuno Nishi-tenma Bldg. 1-6, Nishi-tenma 3-chome, Kita-k, Osaka-shi Osaka 47, JP)
Download PDF:
Previous Patent: AUDIO SIGNAL PROCESSOR, SURROUND SIGNAL GENERATING METHOD, AND SO FORTH
Next Patent: BODY COMPOSITION MEASURING INSTRUMENT
Next Patent: BODY COMPOSITION MEASURING INSTRUMENT