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Patent Searching and Data


Title:
APPARATUS AND METHOD FOR MEASURING RESIDUAL CHLORINE CONCENTRATION
Document Type and Number:
WIPO Patent Application WO/2018/070665
Kind Code:
A1
Abstract:
The present invention relates to an apparatus for measuring residual chlorine concentration, comprising: a measuring part having a light emitting part and a light receiving part, and having a sample water inflow tube through which sample water flows in; a reagent storing part made from a shrinkable material so as to inject a reagent into the measuring part, and having a reagent inflow tube; and a control part for measuring the concentration of an oxidant in the sample water on the basis of a signal generated when light generated by the light emitting part passes through the sample water and then is received in the light receiving part, thereby simplifying a structure so as to improve durability, and controlling the amount of the reagent injected.

Inventors:
PARK KYU WON (KR)
KIM SEONG TAE (KR)
LEE HAI DON (KR)
LEE GWANG HO (KR)
PARK HYE JIN (KR)
CHO YU KYEONG (KR)
Application Number:
PCT/KR2017/009597
Publication Date:
April 19, 2018
Filing Date:
September 01, 2017
Export Citation:
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Assignee:
TECHCROSS CO LTD (KR)
International Classes:
G01N21/79; B63B13/00; B63J4/00; G01N1/20; G01N21/31
Foreign References:
JP2007085881A2007-04-05
KR101649968B12016-08-22
JP2003194709A2003-07-09
KR20140017037A2014-02-11
JP2007093398A2007-04-12
Attorney, Agent or Firm:
NAM, Choong Woo (KR)
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