Title:
APPARATUS AND METHOD FOR PLASMA TREATING A SUBSTRATE
Document Type and Number:
WIPO Patent Application WO2005034163
Kind Code:
A3
Abstract:
Apparatus is provided for plasma treating a substrate. This has a chamber (2) and a plasma generator (4) which forms a plasma from one or more gases flowing within the chamber so as to produce one or more species for interacting with a substrate (8) placed within the chamber. A guide (12) is provided for directing the gas flow containing the species towards the substrate (8). When in use, the width of the plasma is greater than that of the substrate by an amount defining an outer region of plasma. The guide is adapted to direct the species from at least substantially all of the outer region of the plasma towards the substrate. A corresponding method of plasma treatment is also disclosed.
Inventors:
COOKE MICHAEL JOSEPH (GB)
HASSALL GEOFFREY (GB)
HASSALL GEOFFREY (GB)
Application Number:
PCT/GB2004/004158
Publication Date:
November 17, 2005
Filing Date:
September 30, 2004
Export Citation:
Assignee:
OXFORD INSTR PLASMA TECHNOLOGY (GB)
COOKE MICHAEL JOSEPH (GB)
HASSALL GEOFFREY (GB)
COOKE MICHAEL JOSEPH (GB)
HASSALL GEOFFREY (GB)
International Classes:
H01J37/32; (IPC1-7): H01J37/32
Foreign References:
| US6257168B1 | 2001-07-10 | |||
| EP0676790A1 | 1995-10-11 |
Download PDF:
Previous Patent: METHOD FOR INCREASING CURRENT LOAD CAPACITY AND FOR ACCELERATING DYNAMIC CONTACT OPENING OF POWER SW...
Next Patent: ELECTRON EMITTER
Next Patent: ELECTRON EMITTER