Title:
APPARATUS FOR PROCESSING EXHAUST GAS AND METHOD FOR PROCESSING EXHAUST GAS
Document Type and Number:
WIPO Patent Application WO/2010/103846
Kind Code:
A1
Abstract:
A gas mixture discharged from a semiconductor manufacturing apparatus (20) is sent to a filter unit (30) by means of a pump (12), and after removing higher silanes in the filter unit (30), the gas mixture is separated into hydrogen and monosilane by means of a separation unit (40) which utilizes low temperature separation. The separated monosilane is removed by a silane gas removal unit (50). Meanwhile, the separated hydrogen is discharged into the atmosphere by a hydrogen gas discharge unit (60).
Inventors:
SAMURA KEN (JP)
OHUCHI TAI (JP)
ASANO TSUYOSHI (JP)
OKABE TAKASHI (JP)
OHUCHI TAI (JP)
ASANO TSUYOSHI (JP)
OKABE TAKASHI (JP)
Application Number:
PCT/JP2010/001765
Publication Date:
September 16, 2010
Filing Date:
March 11, 2010
Export Citation:
Assignee:
NIPPON OIL CORP (JP)
SAMURA KEN (JP)
OHUCHI TAI (JP)
ASANO TSUYOSHI (JP)
OKABE TAKASHI (JP)
SAMURA KEN (JP)
OHUCHI TAI (JP)
ASANO TSUYOSHI (JP)
OKABE TAKASHI (JP)
International Classes:
B01D53/46; C01B3/56; C23C16/44; F25J3/08; H01L21/205; C01B33/04
Foreign References:
| JPH07253272A | 1995-10-03 | |||
| JPH11191422A | 1999-07-13 | |||
| JP2005108805A | 2005-04-21 | |||
| JP2005116255A | 2005-04-28 | |||
| JP2002001047A | 2002-01-08 |
Attorney, Agent or Firm:
MORISHITA, SAKAKI (JP)
Sakaki Morishita (JP)
Sakaki Morishita (JP)
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