Title:
APPLICATION OF BENZOCYCLOBUTENE RESIN TO IMPRINTING TECHNIQUE, AND METHOD FOR FORMING PATTERN USING THE TECHNIQUE
Document Type and Number:
WIPO Patent Application WO/2010/084918
Kind Code:
A1
Abstract:
Disclosed is a method for forming a pattern of a benzocyclobutene resin by using a thermal imprint lithography technique. Specifically disclosed is a method for forming a pattern by imprinting, which comprises: a step wherein a layer containing a benzocyclobutene resin that is obtained by polymerizing divinylsiloxane-bisbenzocyclobutene is formed on a substrate; a step wherein a mold is pressed against the layer containing a benzocyclobutene resin while being heated and pressurized, so that a pattern is formed in the layer containing a benzocyclobutene resin; and a step wherein the layer containing a benzocyclobutene resin is released from the mold after being cooled, said layer having been provided with the pattern. In the method for forming a pattern by imprinting, the heating temperature is within the range of 150-350˚C.
Inventors:
AOBA KAZUHIRO (JP)
KATAYAMA JUNKO (JP)
KATAYAMA JUNKO (JP)
Application Number:
PCT/JP2010/050719
Publication Date:
July 29, 2010
Filing Date:
January 21, 2010
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
AOBA KAZUHIRO (JP)
KATAYAMA JUNKO (JP)
AOBA KAZUHIRO (JP)
KATAYAMA JUNKO (JP)
International Classes:
B29C59/02; C08F130/08; H01L21/027; B29K23/00; B29K25/00
Foreign References:
| JP2008310944A | 2008-12-25 | |||
| JP2002530505A | 2002-09-17 | |||
| JP2004500719A | 2004-01-08 | |||
| JP2000500617A | 2000-01-18 | |||
| JPH09241419A | 1997-09-16 | |||
| JPH11507601A | 1999-07-06 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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