Title:
ASSEMBLY-TYPE PROFILE UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS INCLUDING SAME
Document Type and Number:
WIPO Patent Application WO/2023/043091
Kind Code:
A1
Abstract:
The present invention relates to a replaceable profile upper electrode and a plasma processing apparatus including same, wherein the upper electrode includes a lower surface in contact with plasma, and includes a first region and a second region respectively having a first thickness and a second thickness, and the lower surface of the upper electrode in contact with plasma is formed as a continuous surface that changes from the second region to the first region, and the second region includes a fastening structure so as to be separated from the upper electrode. Accordingly, the uniformity of plasma formed inside the plasma processing apparatus can be improved, and the replacement cycle of the upper electrode can be increased simultaneously.
Inventors:
PARK JIN KYUNG (KR)
Application Number:
PCT/KR2022/012962
Publication Date:
March 23, 2023
Filing Date:
August 30, 2022
Export Citation:
Assignee:
TEM CO LTD (KR)
International Classes:
H01J37/32
Foreign References:
| KR102236832B1 | 2021-04-06 | |||
| KR20100124350A | 2010-11-26 | |||
| JP2016184610A | 2016-10-20 | |||
| JP2021039924A | 2021-03-11 | |||
| US20200152431A1 | 2020-05-14 |
Attorney, Agent or Firm:
YOON & YANG(IP)LLC (KR)
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