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Title:
ASTIGMATIC OPTICAL ELEMENT, ITS MANUFACTURING PROCESS, ILLUMINATING APPARATUS INCLUDING THE SAME AND ARTICLES TREATED BY THE SAME
Document Type and Number:
WIPO Patent Application WO/1983/004439
Kind Code:
A1
Abstract:
An optical element, by example a mirror, has an optically polished surface which is far from a plane or spherical surface. According to the invention, a flat member (22) is machined along a second face so that thickness of flat member varies. First face is then optically polished when it is plane. Flat member (22) is then distorted so that polished surface takes a neither plane nor revolution shape. Such mirrors are used for distributing laser beam energy along lines or over extended areas with constant energy density.

Inventors:
ARNAUD JEAN PIERRE ALFRED (FR)
Application Number:
PCT/EP1983/000146
Publication Date:
December 22, 1983
Filing Date:
June 07, 1983
Export Citation:
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Assignee:
GLEIZES RAYMOND (FR)
RYFFEL LTD (IE)
International Classes:
G02B7/182; G02B7/18; G02B17/08; G02B26/08; G02B27/62; (IPC1-7): G02B7/18
Foreign References:
US4022523A1977-05-10
US4119366A1978-10-10
US4043644A1977-08-23
US4139270A1979-02-13
US4197157A1980-04-08
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Claims:
CLAIMS
1. Astigmatic optical element for modifying energy distribution of a radiation beam, characterized in that it includes a flat member having variable thickness, pliabl between at least two states and having two opposite large faces, said two states being preparing state in which first large face is plane or of revolution and second large face is substantially a ruled surface, and at least one working state in which said first large face is neither plane nor of revolu¬ tion, and said second large face is substantially a ruled surface, deformation between said two states being provided for by distributed flexion of flat member around ruled surface generatrices, said first large face of flat member being optically polished, said flat member being in its preparing state during polishing of said first large face, and in a working state when optical element is used for reflecting or refrac¬ ting radiation beam.
2. Optical element according to claim 1, characte rized in that it further includes force application means for distorting flat member from one of its preparing and working states to the other.
3. Optical element according to claim 2, characte¬ rized in that said flat member has several working states, and said force application means is provided for adjusting applied forces so that said flat member takes a selected working state.
4. Optical element according to any one of' preceding claims, characterized in that ruled surfaces are cylindri cal surfaces.
5. Optical element according to any one of preceding claims, characterized in that it is a mirror, said polished large face being reflecting.
6. Process for forming an optically polished surface, which includes forming a variable thickness flat member having two large faces, polishing a first large face of said flat member, and applying distorting forces to said memeber, either during polishing, or during use of polished surface, or, with different forces providing for different defor¬ mations, during polishing and during polished surface use, characterized in that forming a variable thickness flat member include forming a member having it second large face which is a nonplane ruled surface, polishing the first large face is provided for when this face is plane or of revolution, and applying distorting forces is provided for by distributed flexing flat member around generatrices of said ruled surface.
7. Process according to claim 6, characterized in that forming said variable thickness flat member includes machining second large face of said flat member.
8. Process according to claim 7, characterized in that machining is provided for by a working step selected in the group including milling, grinding and electric discharge machining.
9. Process according to any one of claims 6 to 8, characterized in that applying distorting forces includes embedding two edges of said flat member parallely to generatrices, in two maintaining members, and applying contracting or spreading forces to said two maintaining members at some distance from flat member in a direction substantially parallel to said flat member and subs an tially perpendicular to generatrices.
10. Illuminating apparatus, characterized in that it includes an energy beam source, an optical element according to claim 5, and a further mirror, variable thickness of flat member of said optical element, applied distorting forces, and further mirror configuration being such that, in a selected plane transverse to said beam, downstream said optical element and said further*mirror, energy distribution is predetermined.
11. Apparatus according to claim 10, characterized in that said further mirror is a circular right section cylindrical mirror for forming a focusing line, and said element flat member has a thickness varying so that, along cylindrical mirror focusing line, energy quantity variation is predetermined.
12. Apparatus according to claim 10, characterized in that said further mirror is an optical element according to claim 5, and said two optical elements are positionned so that a plane including beam axis and a first element generatrix is substantially perpendicular to a plane inclu¬ ding beam axis and a second element generatrix, said two optical elements having thicknesses which vary so that variation of energy density in each unit area of said selected plane is predetermined.
13. Apparatus according to any one of claims 10 to12 characterized in that it further includes further optical means positionned ahead said optical element along said beam axis and for modifying a geometrical parameter of said beam.
14. Apparatus according to any one of claims 10 to13 for treating determined solid material articles, characterized in that it further includes means for conveyin articles with selected velocity, said means being positinned so that article surface is conveyed in a part of said selected plane in which energy distribution is predetermined .
15. Solid material article, having at least a superfic portion whose structure is different from that of untrea ted material, characterized in that said at least superfici portion has been formed by illuminating with an apparatus according to claim 14. wipo.
Description:
PROCESS, ILLUMINATING APPARATUS INCLUDING THE SAME AND ARTICLES TREATED BY THE SAME The invention relates to optical systems especia used in illuminating apparatus. So, it relates to an astig matic optical element, to its manufacturing process, to an illuminating apparatus including such an optical elemen and to articles treated by such an apparatus.

In the following, "optical element" means a refl ting or refracting optical element, such as a mirror or a lens, having an optically polished surface which is not a revolution surface. The word "astigmatic" means that such an optical element is not anastigmatic, that is does not form an image point of an object point. By example, such an optical element distributes energy from a point source along a line or over an extended area. BACKGROUND OF THE INVENTION AND PRIOR ART

The particular problem originally solved by the invention is forming a focusing line along which energy density is uniform, from a monomode or mixed mode laser beam. Obviously, the invention is not restricted to this field, but this problem is interesting to understand the invention features.

In many technical fields, focusing laser beam energy along a line or distributing such energy over an extended area, with a uniform energy density, is desired, but known systems either integrate energy during time, preventing real time treatment and generating different treatment conditions, or chop the greatest part of availabl power, energy yield being only about 30%.

The invention relates to an optical system which gives such an energy distribution. The problem set by such an optical system is that at least a reflecting or refrac¬ ting surface must have a shape far from revolution shape wh cannot be obtained by classical processes used in optical art because surface polishing can be provided only for plane or revolution surfaces.

Some optical systems having a surface which is not strictly plane or spherical have yet been provided-

By example, French Patent n° 2 472 198 discloses a process in which a glass blank is cast and one of its faces is polished either as a plane surface or as a spherical surfac Distorting forces are after applied to blank, by example by vacuum, and blank which is suitably maintained along its edges is globally distorted. The obtained deformation is very small and corresponds at maximum to some wavelength visible light. This deformation is for correcting aberratio of images formed by optical systems. NASA has also developed a flexible mirror for correcting aberrations in images of planets and satellites observed by space probes. This mirror includes many piezo¬ electric actuators providing for local distorsions of refle ting surface, distorsions having an amplitude of about a wavelength of visible light.

So., these optical systems use processes providing for very slight changes of the reflecting surface configur¬ ation and which do not give its main curvature to the surfa Distorting mirrors used by example in fairs and attractions are also known. They are constructed from metal lic plates distorted in alternate directions to provide enlarged or reduced images. Mirror thickness is constant and obtained shapes are not precisely determined ; dis¬ tortions are very great. Optical quality of these mirrors is low.

SUMMARY OF THE INVENTION

The invention relates to providing astigmatic optical elements having at least a surface which is neither plane nor of revolution and which has an excellent optical polish. The surface can be very far from a plane or revol¬ ution surface.

According to the invention, when an optician has determined the ruled surface configuration he desires, computes the thickness variation of a flat member so that, when selected stresses or forces are applied to such member, one of its surfaces takes the desired configuration The surface can be polished when flat member is not yet

distorted, and flat member is then distorted for its poli¬ shed surface to take the desired configuration. Alternatel surface is polished when distorting forces are applied to member, and polished surface takes the desired configur ation either by suppressing forces or by applying differen forces.

According to the invention, an astigmatic optica element for modifying energy distribution in a radiation beam, includes a flat member having variable thickness, ^ pliable between at least two states and having two opposit large faces, these two states being a preparing state in which a first large face is plane or of revolution and a second large face is substantially a ruled surface, and a working state in which the first large face is neither plane nor of revolution and second large face is substan¬ tially a ruled surface, deformation between said two stat being provided for by distributed flexion of flat member around generatrices of ruled surface, first large face of flat member having an optical polish; flat member is put in its preparing state for polishing first large face, and in working state when optical element is used for reflecting or refracting radiation beam.

The whole deformation of flat member from a stat to another can be included in elastic deformation range of member material. By example, when flat member is cons¬ tructed from metal like copper or molybden, deformation can be small enough for applied stresses to do not pass beyond material yield strength. In these conditions, -flat member can be repetitively distorted from a state to the other and inversely. Alternately, applied stresses are above material yield strength and flat member is subjected to a permanent deformation. By example, some annealed cop¬ per mirrors have such a deformation.

Force application is required for flat member deformation and so, optical element preferably includes force application means. Such means can apply forces in one of preparing and working states or in these two states,

as required. Preferably, force application means applies forces to said flat member when said member is to be set at its working state. Such feature is especially preferable when flat member has several working states, amplitude or direction of applied forces determining the peculiar working state taken by said member.

Preferably, ruled surfaces of flat member are cylindrical surfaces.

Preferably, first large face is reflecting. The reflecting surface can be directly constituted by the material of flat member, when such material is metallic, or by a surface of flat member constituted by a non reflec¬ ting material, coated by reflecting metallic layers.

The invention also relates to a process for for- ming a surface with an optical polish, including forming a variable thickness flat member, having two large faces, polishing a first large face of said member and applying distorting forces to flat member, either during polishing, or during polished surface utilization, or, with different forces providing for different deformations, during polish¬ ing and during polished surface utilization; according to the invention, forming said variable thickness member includes forming a member having a second large face which is a non-plane ruled surface, polishing said first face is effected when such face is plane or of revolution, and deformation force application is provided for by distributed flexion of flat member around flat member generatrices.

Forming said variable thickness flat member can be provided by machining said second face. Such machining can be by example milling, grinding, electric discharge machining or all suitable known technics. However, said variable thickness flat member can also be prepared by casting.

Preferably, deformation forces are applied by embedding two edges of flat member parallelly to generat¬ rices into two maintaining members, and by appplying contracting or spreading forces to said maintaining members

at some distance from flat member, in a direction subs¬ tantially parallel to said member and normal to generat¬ rices. Deformation forces can be applied with a fulcrum acting parallely to at least a generatrix. Force applic- ation can provide for deformation of any type, by example by plate buckling or, an the contrary, by straightening of plate yet having some curvature.

In another aspect, the invention relates to an illuminating apparatus including an energy beam source or generator, preferably a laser source, a reflecting op¬ tical element as above-mentionned according to the inven¬ tion, and a further mirror; variable flat member thickness, applied deformation forces and further mirror configuration are such ' that, in a selected plane transverse to said energy beam, downstream said optical element and said fur¬ ther mirror, energy distribution is predetermined.

In one embodiment, said further mirror is a cyl¬ indrical mirror with circular right section for forming a focusing line, and said optical element has variable thickness so that, along focusing line, energy quantity variation is determined, by example zero.

In another embodiment, said further mirror is also a reflecting optical element according tp the inven¬ tion, and the two optical elements are positionned such that a plane including energy beam axis and a ' first optical element generatrix is substantially perpendicular to a plane including said beam axis and a second optical element generatrix, said two optical elements having thicknesses varying so that energy density by unit area in said selected plane is predetermined. This variation can be zero and, in this case, energy density is constant in an extended area.

In another embodiment, apparatus includes a fur¬ ther optical system, positionned along said beam ahead optical element and for modifying a geometrical parameter of said beam. Such a further optical system can be a simple concave or convex mirror having a cylindrical shape,of

circular right section, or it can be an afocal optical system, by example constituted by two cylindrical mirrors. It is especially preferable for this further optical sys-- tern to be constituted by two pliable cylindrical mirrors each having a constant thickness. The two flat members are differently distorted so that the two curvature centers are substantially confused. Such a system .is especially preferable because it allows using a same optical element according to the invention to obtained a continuous focusing line having a selected length from monomode laser beams of different diameters.

In an other embodiment, said illuminating appa¬ ratus also includes means for conveying articles with a selected velocity, said means being positionned so that article surface is conveyed in a portion of said selec¬ ted plane in which energy distribution is predetermined, by example constant. Such an apparatus is especially suitable for treating solid material articles, by example for thermal treating of articles. In an other aspect of the invention, a process is provided for illuminating articles by using such an apparatus. The illuminating process is especially useful when said apparatus forms a focused line having a substantially constant energy density or an extended area in which energy density is substantially constant. The selected velocity of said conveying means is also adjusted according to the desired treatment. When velocity is relat¬ ively great, said treatment is a mere modification of structure of a superficial portion of conveyed article, the surface material being kept under melting temperature. When conveying velocity is lower, superficial article por¬ tion can be in a melted or viscous state fluid enough to provide for some superficial rearrangement. When velocity is yet lower and/or energy density greater, material of superficial portion can be volatilized either completely or by volatilization of some elements only.

In an other aspect of the invention, solid

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material articles have at least a portion of superficial area which has a structure different from that of untreated article material, such different structure being pro¬ vided by illuminating said superficial portion in an illuminating apparatus as above disclosed. BRIEF DESCRIPTION OF DRAWING

Other features and advantages of the invention will be better understood from the following description of particular embodiments, referring to enclosed drawing in which:

Figure 1 is a perspective of an equalizer cylin¬ drical mirror according to the invention;

Figure 2 is a top elevation cross-sectionnal view along line 2-2 of " figure 1 ; and Figure 3 is a schematic partial sectionnal view of an example of stepped flat member obtained by milling according to the invention. DETAILED DESCRIPTION

Figure 1 is a perspective of a typical astigmatic optical element according to the invention, forming a mirror for energy equalizing along a focusing line formed by a cylindrical mirror having circular right section (not shown) .

Equalizing concave mirror shown by figure 1 include a fixed unit 10 and a pliable unit 12. Fixed unit 10 inc¬ ludes a U-shape bar member 14 having a rectangular plate 16 fixed by screws 18 at each end. Member 14 and plates •16 form a rigid unit which can be mounted by example on a supporting post. Two threaded holes 19 are formed through sides of member 14 and are coaxially positionned. Screws 20 are received in threaded holes 19.

Pliable unit 12 first includes a flat member 22 with variable thickness, forming a pliable plate, and two supports 24. In the shown embodiment, plate 22 has holes in its edges for receiving screws, for clamping straps 26 against supports 24 so that edges of plate< 22 are practically "embedded" in maintaining members each inclu¬ ding one support 24 and one strap 26.

Pliable unit is supported by fixed unit through the two screws 20. Conical sockets 28 with conical angles of 90° are formed in supports 24 of maintaining members and receive rounded ends 30 of screws 20. So, as shovn by figure 2, threading screws 20 into holes 19 spreads external portions (in figure 2) of supports 24 which spread at some distance from plate 22. Plate 22 has to flex as a hinge and then takes a configuration which depends on its thickness. As thickness varies, configuration of plate 22 varies. Computing easily allows determination of obtained configuration, as shown by the following example.

It is to be noted that pliable unit is maintained only by two screws 20 which allow pivoting around their rotation axis. Pliable unit so tends to come against one of plates 16, and it is retained by screws 32 (two only are shown by figure ) disposed above and under straps 26 and allowing adjustment of pliable unit position around its rotation axis passing through screws 20. Alternately, the two screws 32 of each plate 16 are replaced by a central screw pushing against the central portion of a bar (not shown) positionned against straps 26.

It is also to be noted on figure 2 that slots 34 form openings in plates 16 near edges of plate 22; said slots are for blowing air or other gas along plate 22 when it is illuminated by laser beam. Each slot 34 communicates with a chamber (not shown) formed inside each plate 16 and connected by a port 36 to suitable compressed air or gas source. Gas blowing provides for cooling plate 22 and for preventing dirt deposition on plate. Such a mounting allows illuminating plate 22 with energy density of about 2500 to 3500 W/cm 2 and more.

Figure 3 is a schematic cross-section of a typica plate 22 according to the invention. It is to be noted that projection 38 is limited by steps opposite the area 40 of large face truly illuminated when mirror is used. As steps have a very small height (some hundredths pi

millimeter) and have mid-points of steps on the desired theoretical curve for thickness variation, useful reflec¬ ting portion 40, when distorted, takes practically a configuration identical to the desired theoretical curve. When the flat member shown as plate 22 is manu¬ factured, a plate having a thickness above maximal thick¬ ness (by some tenths of millimeter) is rectified so that a first large face is plane. Rectified face is then fixed to a rigid support and the second face is machined by example by milling along steps. Plate is then removed from rigid support, and second face is embedded in a plaster or plastic material block, and first face is then polished.. Flat member can be used after removal of plaster or plastic material, respectively. Plate can be formed of OFHC copper. Annealed copper, molybden, gold coated metals a e others useful materia

Computing thickness variation desired for plate is not described because it is well-known by the man in the art of material elasticity and is easy. Thickness var- riation depends on how distorting forces are applied to plate. Embedment of plate has been shown in the typical embodiment, but plate can be simply clamped between two jaws, or it can be polished when it has the configuration of a circular right section cylinder, and straightened by pulling edges, variable thickness parts having obviously been formed before by machining second face opposite to polished face. So, plate designing depends on expected force application mode. Applied forces themselves obviously depend on material used for plate. Computing is obviously simpler when material is homogeneous and isotropic. However, materials having anisotropic properties can be used, a preferential direction then being parallel or perpendicular to generatrices.

In a typical embodiment, a cylindrical mirror is designed for distributing energy from a monomode laser generator beam having a gaussian energy distribution with a diameter equal to 10,5 mm (at 1 /e ) . Constant energy

can be obtained along a focusing line having a length of 7 mm and formed by a further cylindrical mirror having a circular right section. This mirror has a focal length equal to 150 mm. Curvature radius required for polished equalizing mirror surface is computed from center for obtaining a focusing line with a constant energy density when equalizing mirror is 300 mm ahead focusing mirror. Computing shows that curvature radius of equalizing mirror varies from 1744 mm at center to 451 mm at 13 mm away from center. At 5 mm from center, radius is 650 mm and, at 10 mm from center, it is 460 mm. Thickness of an annealed copper plate 22 having a free length of 60 mm between two embedding members 24,26 is then computed. Central thickness is selected with a value of 2,90 mm. Thickness is then computed and is 1,97 mm at 5 mm from center, 1,63 mm at 10 mm from center, and 1,53 mm at 13 mm from center. (Results are rounded at the nearest millimeter hundredth) . Plate is then milled with steps of 0,5 mm width (measured across the plate) . Step heights are computed so that each step center is on the desired theoretical curve.

When this equalizing mirror and a further cylin¬ drical mirror are used,- they form a focusing line of 7 mm length and 0,3 mm width, in which about 95% of incident laser beam energy is included. According to the invention, a uniform energy distribution can also be obtained over a plane. So, two equalizing mirrors can be used, by example with the same thickness variation. In an embodiment, two equalizing mirrors designed with above-indicated dimensions are positionned so that plane including beam axis and a respecti generatrix are mutually perpendicular. Different forces are applied to the two mirrors so that the plane in which energy distribution is uniform is the same for the two mirrors, though mirrors are positionned sequentially along beam axis. Energy density is practically constant in a square of 7 mm x 7 mm.

When ruled surface of second flat member is

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cylindrical, that is when generatrices are all parallel, mirrors shifted by 90° around beam axis do not introduce aberrations. In fact, in each plane including a generatrix and parallel to laser beam, flat member acts as a simple plane mirror and so does not generate aberrations.

The above-described optical system forming a focusing line of 7 mm length is used for treating articles formed from different materials.

In a first example, article is constituted from 40 CDV 20 steel. Article is conveyed so that focusing line is practically at the article surface. Conveying velocity is selected so that applied energy quantity is about 1000 J/cm 2 . After treatment, it appears that article has been surface hardened, its Vickers hardness HV50 being increased from 220 in base metal to 400 at a distance of 0,1 mm from surface and to 500 at surface.

In an other example, this article is replaced by sintered alumina article containing 96% of Al-O^. Applied energy density is about 50 J/cm 2 , conveying velocity being proportionately increased. Root mean square roughness is reduced from about 0,1 micron before treating to less than 0,005 micron after treating. INDUSTRIAL WORKING POSSIBILITIES

Astigmatic optical elements according to the invention have many industrial applications in very diffe¬ rent technical fields. By example, mechanical and metallur¬ gical applications are yet known in which X-Y scanning of laser beams is used for surface treatment. Illuminating apparatus according to the invention is especially suitable in these applications. By example, known processes are surface treatment such as surface metal hardening, by example local hardening of crankshafts, etc, valve seat plating, by example with corrosion resistant alloy, etc. Treatments as laser glazing are practically useful only with such an optical system.

In other technical fields, illuminating apparatus allow roughness reduction. By example, sintered alumina

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ceramics can be practically glazed. This treatment is preferably used for electronic circuit substrates and for sealing pieces, now costly grounded.