Title:
ATOMIZED BASE MATERIAL, SLURRY FOR MANUFACTURING ATOMIZED BASE MATERIAL, AND METHOD FOR MANUFACTURING ATOMIZED BASE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2023/015741
Kind Code:
A1
Abstract:
An atomized base material, comprising a loose layer and a compact layer, wherein a surface of the loose layer is a seepage surface, a surface of the compact layer is an atomized surface, a plurality of pore structures are formed in the loose layer and the compact layer, the pore diameter of the pore structures in the loose layer is larger than that of the pore structures in the compact layer, the thickness of the loose layer is larger than that of the compact layer, and an atomized liquid permeates the atomized base material from the seepage surface. Further disclosed in the present application are a slurry for manufacturing the atomized base material, and a method for manufacturing the atomized base material.
Inventors:
ZHAN HAILIN (CN)
LI YINGYUE (CN)
LI CHANGSHUN (CN)
LI YAYONG (CN)
LI YINGYUE (CN)
LI CHANGSHUN (CN)
LI YAYONG (CN)
Application Number:
PCT/CN2021/128190
Publication Date:
February 16, 2023
Filing Date:
November 02, 2021
Export Citation:
Assignee:
ANHUI JINGMENG NEW MATERIAL TECH CO LTD (CN)
International Classes:
C04B35/10; C04B35/634; F28D15/04
Foreign References:
| CN111700310A | 2020-09-25 | |||
| CN108724434A | 2018-11-02 | |||
| CN111053291A | 2020-04-24 | |||
| GB201717589D0 | 2017-12-13 |
Attorney, Agent or Firm:
SHENZHEN CHINA INNOVATION SOUTH INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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