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Title:
BASE OF CLEANING SYSTEM, CLEANING SYSTEM, AND ROLLER BRUSH CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/121304
Kind Code:
A1
Abstract:
A base (100) of a cleaning system (1000), a cleaning system (1000), and a roller brush (931) cleaning method. The base (100) is used for the detachable placement of a cleaning host (900) of the cleaning system (1000). The cleaning host (900) has a cleaning component (930). The base (100) is provided with a drying groove (22), such that at least part of the cleaning component (930) is located in the drying groove (22). The base (100) is also provided with a drying apparatus (70) for drying the cleaning component (930) at the drying groove (22).

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WO/2022/078503CLEANING SYSTEM
Inventors:
HE JIE (CN)
ZHANG YONGSHENG (CN)
WANG TAO (CN)
XI WEIYONG (CN)
ZHU XIAOJUN (CN)
XIE YAO (CN)
CHENG YIFU (CN)
LI YANG (CN)
WANG GANG (CN)
WANG ZHIBAO (CN)
XU QIANYUE (CN)
LI XIANGDONG (CN)
Application Number:
PCT/CN2021/105567
Publication Date:
June 16, 2022
Filing Date:
July 09, 2021
Export Citation:
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Assignee:
JIANGSU MIDEA CLEANING APPLIANCES CO LTD (CN)
MIDEA GROUP CO LTD (CN)
International Classes:
A47L11/24; A47L11/282; A47L11/40
Foreign References:
CN112401771A2021-02-26
CN112716390A2021-04-30
CN112617689A2021-04-09
CN209404651U2019-09-20
CN108703719A2018-10-26
CN110946524A2020-04-03
CN111358382A2020-07-03
CN111973089A2020-11-24
CN108903795A2018-11-30
US20200237177A12020-07-30
Attorney, Agent or Firm:
TSINGYIHUA INTELLECTUAL PROPERTY LLC (CN)
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