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Title:
BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
Document Type and Number:
WIPO Patent Application WO/2014/208632
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a base generator which has high solubility in widely used organic solvents, can be dissolved directly in a base-reactive compound such as an epoxy compound, has both high heat resistance and low nucleophilicity, and enables the generation of a strong base; a base-reactive composition comprising the base generator and a base-reactive compound; a method for generating a base; and others. The present invention relates to: a compound represented by general formula (A); a base generator comprising the compound; a base-reactive composition characterized by comprising the base generator and a base-reactive compound; a method for generating a base; and others. (In the formula, R1 to R5 independently represent a hydrogen atom, an alkyl group, an aryl group which may have a substituent, or an arylalkyl group which may have a substituent; R6 represents a hydrogen atom, an alkyl group which may have a substituent, an alkenyl group, an alkynyl group, an aryl group which may have a substituent, or an arylalkyl group which may have a substituent; R7 represents a hydrogen atom, an alkyl group which may have an amino group, an aryl group which may have a substituent, or an arylalkyl group which may have a substituent; and Z- represents an anion derived from a carboxylic acid having a specific structure.)

Inventors:
SAKAI NOBUHIKO (JP)
YANABA KOSUKE (JP)
ARIMITSU KOJI (JP)
Application Number:
PCT/JP2014/066912
Publication Date:
December 31, 2014
Filing Date:
June 25, 2014
Export Citation:
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Assignee:
WAKO PURE CHEM IND LTD (JP)
UNIV TOKYO SCIENCE FOUNDATION (JP)
International Classes:
C07C59/84; C07C65/28; C07C279/26; C07D311/86; C09K3/00
Foreign References:
FR2796940A12001-02-02
US3261809A1966-07-19
JPS59106994A1984-06-20
JPH09292712A1997-11-11
JP2006022105A2006-01-26
JPS56118057A1981-09-16
JP2011515553A2011-05-19
JP2012131936A2012-07-12
JP2011236416A2011-11-24
JP2012250969A2012-12-20
US2768205A1956-10-23
US3261809A1966-07-19
JPH09278378A1997-10-28
JPH09292712A1997-11-11
JPH115033A1999-01-12
Other References:
J. AM. CHEM. SOC., vol. 117, 1995, pages 11369
J. AM. CHEM. SOC., vol. 130, 2008, pages 8130
TETRAHEDRON LETT., vol. 39, 1998, pages 2743
CHEM. BER., vol. 117, 1984, pages 1900 - 1912
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