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Patent Searching and Data


Title:
BASE MATERIAL RETENTION DEVICE, BASE MATERIAL RETENTION METHOD, AND CURVED SURFACE SCREEN PRINTING DEVICE EQUIPPED WITH BASE MATERIAL RETENTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/153497
Kind Code:
A1
Abstract:
This base material retention device (1) comprises: a pedestal (2) having a retention surface (21A) on which a base material (G) is placed; a positioning unit (3) configured to position the base material (G) in a predetermined retention position on the retention surface (21A); and a suction unit (4) configured to suction, to the pedestal (2), the base material (G) positioned at the predetermined retention position. The positioning unit (3) includes: a first pressing unit (31) configured to press the base material (G) to the pedestal (2); an outer edge contact member (32) that is provided to the pedestal (2) and that is configured to contact a portion of an outer edge of the base material (G); and a second pressing unit (34) configured to press the outer edge of the base material (G) so as to make the base material (G) contact the outer edge contact member (32).

Inventors:
MATSUDA KEISUKE (JP)
TATEYAMA YUUKI (JP)
Application Number:
PCT/JP2020/002611
Publication Date:
July 30, 2020
Filing Date:
January 24, 2020
Export Citation:
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Assignee:
AGC INC (JP)
International Classes:
B41F15/20; B41F15/08
Domestic Patent References:
WO2017086197A12017-05-26
WO2017086197A12017-05-26
Foreign References:
JP2003034013A2003-02-04
JP2007160692A2007-06-28
JPS5684962A1981-07-10
JP2009119512A2009-06-04
JP2012092395A2012-05-17
JPH0369366A1991-03-25
JPH06210827A1994-08-02
US20160039196A12016-02-11
JP2019010187A2019-01-24
Other References:
See also references of EP 3882031A4
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (JP)
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