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Patent Searching and Data


Title:
BATCH-TYPE SUBSTRATE-PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2010/087638
Kind Code:
A3
Abstract:
Disclosed is a batch-type substrate-processing apparatus which can process a plurality of substrates at the same time, and in which a gas supply pipe and a gas exhaust pipe for supplying and discharging gas for creating an atmosphere during substrate processing are opposite one another in a chamber and which can uniformly supply a substrate process gas to the substrate loaded in the chamber. According to the present invention, a batch-type substrate-processing apparatus (1), which can process a plurality of substrates at the same time, comprises: a chamber (20) for providing a substrate processing space for a plurality of substrates (10); a boat (30) on which the plurality of substrates (10) are loaded and supported; a plurality of heaters (70) arranged at predetermined intervals along the substrate lamination direction; and a gas pipe base (300) arranged in the chamber (20), wherein said gas supply pipe (100) and said gas exhaust pipe (200) are connected to said gas pipe base (300).

Inventors:
HUR KWAN SUN (KR)
WEE KWANG HEE (KR)
CHO JAE HYUN (KR)
Application Number:
PCT/KR2010/000540
Publication Date:
October 28, 2010
Filing Date:
January 29, 2010
Export Citation:
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Assignee:
TERA SEMICON CORP (KR)
HUR KWAN SUN (KR)
WEE KWANG HEE (KR)
CHO JAE HYUN (KR)
International Classes:
H01L21/324; H01L21/205
Foreign References:
JP2004179672A2004-06-24
KR20060048480A2006-05-18
KR20050015931A2005-02-21
Attorney, Agent or Firm:
KIM, Han (641-3 Yeoksam-dong Kangnam-gu, Seoul 135-909, KR)
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