Title:
BEST FOCUS DETECTING METHOD, EXPOSURE METHOD AND EXPOSURE EQUIPMENT
Document Type and Number:
WIPO Patent Application WO/2005/124834
Kind Code:
A1
Abstract:
An aerial image of a measurement mark (PM) provided on a measurement mask (Rm) is matched with a center in an X axis direction of a slit (122) provided on a Z tilt stage (38). While the measurement mark is irradiated with irradiation light (IL), a slit board (190) whereupon the slit (122) is formed is continuously shifted in a Z axis direction. Based on positional information of the slit (122) obtained during the shift, and a photoelectric conversion signal outputted from an optical sensor (24), which received the irradiation light (IL) from the measurement mark (PM) through a projection optical system (PL) and the slit (122), a best focus position is detected. Thus, the best focus position of the projection optical system can be measured in a short time.
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Inventors:
KONDO NAOTO (JP)
HAGIWARA TSUNEYUKI (JP)
HAGIWARA TSUNEYUKI (JP)
Application Number:
PCT/JP2005/011330
Publication Date:
December 29, 2005
Filing Date:
June 21, 2005
Export Citation:
Assignee:
NIKON CORP (JP)
KONDO NAOTO (JP)
HAGIWARA TSUNEYUKI (JP)
KONDO NAOTO (JP)
HAGIWARA TSUNEYUKI (JP)
International Classes:
G01B11/00; G01M11/02; G03F9/00; G03F9/02; H01L21/027; (IPC1-7): H01L21/027; G01B11/00; G01M11/02; G03F9/02
Foreign References:
| JP2002093690A | 2002-03-29 | |||
| JPH0883753A | 1996-03-26 | |||
| JPH05160003A | 1993-06-25 | |||
| JP2003151884A | 2003-05-23 | |||
| JP2005116571A | 2005-04-28 | |||
| JPH0982620A | 1997-03-28 | |||
| JP2003218024A | 2003-07-31 |
Attorney, Agent or Firm:
Tateishi, Atsuji (Karakida Center Bldg. 1-53-9, 1-53-9, Karakid, Tama-shi Tokyo 35, JP)
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