BIPOLAR PLASMA SOURCE, PLASMA SHEET SOURCE, AND EFFUSION CELL UTILIZING A BIPOLAR PLASMA SOURCE

Title:

BIPOLAR PLASMA SOURCE, PLASMA SHEET SOURCE, AND EFFUSION CELL UTILIZING A BIPOLAR PLASMA SOURCE

Document Type and Number:

WIPO Patent Application WO2002079815

Kind Code:

A3

Abstract:

A plasma source includes a structure made up of two hollow cathode shapes (1,2) connected to a bipolar AC power supply (5). The bipolar power supply alternately drives one hollow cathode to a negative voltage while the opposite hollow cathode is driven to a positive voltage. As one of the two hollow cathode shapes is driven negative, the hollow cathode discharge forms within the corresponding cavity. The other cathode then forms an anode, causing electrons to escape the plasma and travel to the other side, completing the electric circuit. The plasma generator thus formed may be used as a heat source for an effusion cell to form a plasma from the reactant gas, or to increase the reactivity of gas situated between a vacuum deposition source and a substrate to be coated.

Inventors:

MASCHWITZ PETER
LI JAIME

Application Number:

PCT/US2002/006666

Publication Date:

May 01, 2003

Filing Date:

March 27, 2002

Export Citation:

Click for automatic bibliography generation Help

Assignee:

CPFILMS INC (US)

International Classes:

C23C14/24; C23C14/32; H01J37/32; H05H1/24; (IPC1-7): B23K10/00

Foreign References:

US4914356A	1990-04-03
US5846608A	1998-12-08
US5614273A	1997-03-25
US5939829A	1999-08-17

Other References: