Title:
BLANK MASK AND PHOTOMASK
Document Type and Number:
WIPO Patent Application WO/2024/010238
Kind Code:
A1
Abstract:
A photomask according to an embodiment comprises: a substrate; and a plurality of patterns disposed on the substrate, wherein the patterns comprise a first layer and a second layer having different electrical conductivities, and have an electrical conductivity of 500 S/cm to 2000 S/cm.
Inventors:
PARK HEUN (KR)
KIM KAB YOUNG (KR)
SON HAE ROK (KR)
KIM KAB YOUNG (KR)
SON HAE ROK (KR)
Application Number:
PCT/KR2023/008223
Publication Date:
January 11, 2024
Filing Date:
June 14, 2023
Export Citation:
Assignee:
LG INNOTEK CO LTD (KR)
International Classes:
G03F1/40; G03F1/50
Foreign References:
| KR20140048053A | 2014-04-23 | |||
| KR20000076470A | 2000-12-26 | |||
| KR101703654B1 | 2017-02-09 | |||
| US20030031934A1 | 2003-02-13 | |||
| US20220197131A1 | 2022-06-23 |
Attorney, Agent or Firm:
HAW, Yong Noke (KR)
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