Title:
CARRIER HEAD MEMBRANE ROUGHNESS TO CONTROL POLISHING RATE
Document Type and Number:
WIPO Patent Application WO/2010/068691
Kind Code:
A3
Abstract:
An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
Inventors:
PAIK YOUNG J (US)
BHATNAGAR ASHISH (US)
NARENDRNATH KADTHALA RAMAYA (US)
BHATNAGAR ASHISH (US)
NARENDRNATH KADTHALA RAMAYA (US)
Application Number:
PCT/US2009/067376
Publication Date:
August 19, 2010
Filing Date:
December 09, 2009
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
PAIK YOUNG J (US)
BHATNAGAR ASHISH (US)
NARENDRNATH KADTHALA RAMAYA (US)
PAIK YOUNG J (US)
BHATNAGAR ASHISH (US)
NARENDRNATH KADTHALA RAMAYA (US)
International Classes:
H01L21/304
Foreign References:
| US20020094767A1 | 2002-07-18 | |||
| US20010041526A1 | 2001-11-15 | |||
| US20020039879A1 | 2002-04-04 |
Attorney, Agent or Firm:
ZANOCCO, Jennifer A. (Minneapolis, Minnesota, US)
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