Title:
CATADIOPTRIC PROJECTION SYSTEM FOR 157 NM LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2002044786
Kind Code:
A3
Abstract:
A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1-M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4-E13. The first optical group G1 provides compensative axial aberrative correction for the second optical group G2 which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown.
Inventors:
HUDYMA RUSSELL (US)
Application Number:
PCT/EP2001/013851
Publication Date:
August 29, 2002
Filing Date:
November 28, 2001
Export Citation:
Assignee:
ZEISS CARL SEMICONDUCTOR MFG (DE)
HUDYMA RUSSELL (US)
HUDYMA RUSSELL (US)
International Classes:
G02B17/08; G03F7/20; G02B13/24; H01L21/027; (IPC1-7): G02B17/08; G03F7/20
Domestic Patent References:
| WO2001051979A2 | 2001-07-19 |
Foreign References:
| EP0736789A2 | 1996-10-09 | |||
| EP0989434A2 | 2000-03-29 | |||
| DE19726058A1 | 1998-01-02 | |||
| US5694241A | 1997-12-02 | |||
| US4701035A | 1987-10-20 |
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