CHAMBER FOR GAS LASER APPARATUS, GAS LASER APPARATUS, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

WIPO Patent Application WO/2024/009662

A1

This chamber for a gas laser apparatus in which laser gas is sealed in an internal space thereof comprises: a first main electrode and a second main electrode that face each other across a gap in the internal space, with the longitudinal direction being along a prescribed direction; a window that is provided to a wall surface of the chamber and through which light from the internal space is transmitted; and a first preliminary ionization electrode that is provided to one lateral side of the first main electrode. The first preliminary ionization electrode includes a first dielectric pipe that extends along the longitudinal direction, a first preliminary ionization internal electrode that is disposed inside the first dielectric pipe and extends along the longitudinal direction, and a first preliminary ionization external electrode that extends along the longitudinal direction and includes a first end portion that faces the outer circumferential surface of the first dielectric pipe, the first preliminary ionization external electrode extending from the first end portion in a direction away from the first dielectric pipe, and a first corona discharge angle in a plane that is perpendicular to the longitudinal direction being acute.

NAGAI KAZUKI (JP)
SASAKI YOICHI (JP)
SERCEL JEFFREY P (US)
DADELSZEN MICHAEL VON (US)

PCT/JP2023/020512

January 11, 2024

June 01, 2023

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GIGAPHOTON INC (JP)

H01S3/038; H01S3/097

WO2020174571A1	2020-09-03
WO1992014285A1	1992-08-20

JP2001168432A	2001-06-22
JP2001044544A	2001-02-16
JP2015018910A	2015-01-29
US4709373A	1987-11-24

MORIMURA Yasuo (JP)

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