CHARGED PARTICLE BEAM DEVICE - HITACHI HIGH TECH CORP

Title:

CHARGED PARTICLE BEAM DEVICE

Document Type and Number:

WIPO Patent Application WO/2022/185390

Kind Code:

A1

Abstract:

The purpose of the present invention is to provide a charged particle beam device that can specify irradiation conditions for primary charged particles that can obtain a desired charged state without adjusting the acceleration voltage. The charged particle beam device according to the present invention specifies the irradiation conditions for a charged particle beam in which the charged state of a sample is switched between a positive charge and a negative charge, and adjusts the irradiation conditions according to the relationship between the specified irradiation conditions and the irradiation conditions when an observation image of the sample has been acquired (see fig. 8).

More Like This:

JP2019194585	EELS DETECTION TECHNIQUE IN ELECTRON MICROSCOPE
WO/2002/103744	ELECTRON MICROSCOPE AND ITS FOCAL POINT CONTROL METHOD
JP3780620	Electron spectrometer and transmission electron microscope equipped with it

Inventors:

TERAO NAHO (JP)
YOKOSUKA TOSHIYUKI (JP)
KOTSUJI HIDEYUKI (JP)
NAKANO TOMOHITO (JP)
KAWANO HAJIME (JP)

Application Number:

PCT/JP2021/007766

Publication Date:

September 09, 2022

Filing Date:

March 01, 2021

Export Citation:

Click for automatic bibliography generation Help

Assignee:

HITACHI HIGH TECH CORP (JP)

International Classes:

H01J37/22

Domestic Patent References:

WO2002001597A1

2002-01-03

Foreign References:

JP2002310963A

2002-10-23

Attorney, Agent or Firm:

HIRAKI & ASSOCIATES (JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: DISPLAY DEVICE

Next Patent: RANDOM NUMBER GENERATION SYSTEM, RANDOM NUMBER GENERATION DEVICE, RANDOM NUMBER GENERATION METHOD, A...