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Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/067681
Kind Code:
A1
Abstract:
The present invention provides a charged particle beam device which makes it possible to precisely manage the temperature when a cold field emission electron source is heated. Provided is a charged particle beam device comprising: a cold field emission electron source which is provided with a tip having a sharpened end, a filament connected to the tip, and an auxiliary electrode covering the filament and having an opening through which the tip protrudes; an extraction electrode to which an extraction voltage for extracting electrons from the cold field emission electron source is applied; and an acceleration electrode to which an acceleration voltage for accelerating the electrons extracted from the cold field emission electron source is applied. The charged particle beam device is characterized in that, when the tip and the filament are heated, a voltage that is positive with respect to the tip is applied to the auxiliary electrode to cause thermoelectrons emitted from the tip and the filament to accumulate at the auxiliary electrode, and the current is measured.

Inventors:
KASUYA KEIGO (JP)
ISHIKAWA SHUHEI (JP)
TANIMOTO KENJI (JP)
WATANABE SHUNICHI (JP)
DOI TAKASHI (JP)
SAKAI YUSUKE (JP)
Application Number:
PCT/JP2021/038557
Publication Date:
April 27, 2023
Filing Date:
October 19, 2021
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/04; H01J37/065; H01J37/07; H01J37/073
Foreign References:
JP2007073521A2007-03-22
JPS5012959A1975-02-10
JPS50100964A1975-08-11
JPS57165944A1982-10-13
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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