CHARGED PARTICLE MICROSCOPE

WIPO Patent Application WO/2011/055521

A1

Provided is a mechanism whereby an ion irradiation system can be made more compact, the length of the ion optics can be reduced, and the direction in which ions are discharged from an emitter tip (21) toward a sample can be adjusted accurately. The charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture (6) which limits the ion beam that has passed through the focusing lens; a first deflector (35) which scans or aligns the ion beam that has passed through the first aperture; a second deflector (7) which deflects the ion beam that has passed through the first aperture; a second aperture (36) which limits the ion beam that has passed through the first aperture; an objective lens (8) which focuses, on a sample, the ion beam that has passed through the first aperture; and a means for measuring the signal, which is substantially proportional to the current of the ion beam that has passed through the second aperture.

SHICHI HIROYASU (JP)
MATSUBARA SHINICHI (JP)
ARAI NORIAKI (JP)
ISHITANI TOHRU (JP)
OSE YOICHI (JP)
KAWANAMI YOSHIMI (JP)

PCT/JP2010/006425

May 12, 2011

November 01, 2010

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HITACHI HIGH TECH CORP (JP)
SHICHI HIROYASU (JP)
MATSUBARA SHINICHI (JP)
ARAI NORIAKI (JP)
ISHITANI TOHRU (JP)
OSE YOICHI (JP)
KAWANAMI YOSHIMI (JP)

H01J37/28; H01J27/26; H01J37/04; H01J37/08; H01J37/09

JP2009163981A	2009-07-23
JP2005063865A	2005-03-10
JP2008140557A	2008-06-19
JP2006134638A	2006-05-25

INOUE, Manabu et al. (JP)
Manabu Inoue (JP)

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