CHEMICAL LIQUID, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING SEMICONDUCTOR CHIP, CHEMICAL LIQUID RECEPTOR, METHOD FOR PRODUCING CHEMICAL LIQUID

Title:

CHEMICAL LIQUID, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING SEMICONDUCTOR CHIP, CHEMICAL LIQUID RECEPTOR, METHOD FOR PRODUCING CHEMICAL LIQUID

Document Type and Number:

WIPO Patent Application WO/2020/170742

Kind Code:

A1

Abstract:

The present invention provides a chemical liquid exhibiting excellent defect inhibition properties when used as a pre-wet liquid. Provided are a resist pattern formation method, a method for producing a semiconductor chip, a chemical liquid receptor, and a method for producing the chemical liquid. The chemical liquid according to the present invention contains: cyclohexanone; and at least one first compound selected from the group consisting of a compound represented by general formula (1), a compound represented by general formula (2), and a compound represented by general formula (3), wherein the content of the cyclohexanone is 98.000-99.999 mass% with respect to the total mass of the chemical liquid, the total content of the first compound is 0.001-100 mass ppm with respect to the total mass of the chemical liquid, and said chemical liquid is used as a pre-wet liquid.

Inventors:

KAMIMURA TETSUYA (JP)

Application Number:

PCT/JP2020/003178

Publication Date:

August 27, 2020

Filing Date:

January 29, 2020

Export Citation:

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Assignee:

FUJIFILM CORP (JP)

International Classes:

B65D77/00; G03F7/038; G03F7/039; G03F7/16; G03F7/20; G03F7/38

Domestic Patent References:

WO2017169833A1	2017-10-05
WO2018061573A1	2018-04-05
WO2014148241A1	2014-09-25

Foreign References:

JP2004039828A	2004-02-05
JP2015227501A	2015-12-17
JP2008264929A	2008-11-06
JP2015123351A	2015-07-06
JP2016138219A	2016-08-04
JP2013195844A	2013-09-30
JP2016057645A	2016-04-21
JP2015207006A	2015-11-19
JP2016188385A	2016-11-04
JP2017219818A	2017-12-14

Other References: