Title:
CHEMICAL LIQUID SUPPLY DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/113905
Kind Code:
A1
Abstract:
A chemical liquid supply device capable of smoothly discharging a chemical liquid.
A chemical liquid supply device is provided with: a chemical liquid container for containing a viscous chemical liquid; a chemical liquid discharge mechanism having a guide section having formed therein a flow path for guiding downward the chemical liquid discharged from the chemical liquid container; and a support member for receiving the chemical liquid discharged to the outside through the guide section of the chemical liquid discharge mechanism. At least a part of the guide section and the support member consists of a resinous material which contains an anti-blur agent.
Inventors:
HONZAWA YASUNORI (JP)
Application Number:
PCT/JP2010/055621
Publication Date:
October 07, 2010
Filing Date:
March 30, 2010
Export Citation:
Assignee:
KOBAYASHI PHARMA (JP)
HONZAWA YASUNORI (JP)
HONZAWA YASUNORI (JP)
International Classes:
E03D9/02
Foreign References:
JP2008163686A | 2008-07-17 | |||
JP2008138378A | 2008-06-19 | |||
JP2004520507A | 2004-07-08 |
Download PDF:
Previous Patent: CHARGE SYSTEM, CHARGER, AND METHOD FOR DETECTING CLOSING/FIXING OF RELAY
Next Patent: MET INHIBITOR COMPRISING EPHEDRAE HERBA
Next Patent: MET INHIBITOR COMPRISING EPHEDRAE HERBA