Title:
CHEMICAL-RESISTANT PROTECTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2023/084961
Kind Code:
A1
Abstract:
Provided is a protective film-forming composition that can form a protective film having excellent resistance to a wet etchant for semiconductors, and that can also be effectively used as a composition for forming a resist underlayer film. This protective film-forming composition for a wet etchant for semiconductors comprises (A) a compound or polymer having a reactive group that can undergo a crosslinking reaction in the presence of a base, (B) a base, and (C) a solvent.
Inventors:
NISHITA TOKIO (JP)
KINOSHITA KAZUHIKO (JP)
KINOSHITA KAZUHIKO (JP)
Application Number:
PCT/JP2022/037571
Publication Date:
May 19, 2023
Filing Date:
October 07, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
H01L21/312; C08K5/3445; C08L7/02; C08L63/00; C08L101/02; G03F7/11; G03F7/20; G03F7/26; G03F7/40; H01L21/027
Foreign References:
| JPS6256947A | 1987-03-12 | |||
| JP2009174041A | 2009-08-06 | |||
| JPS61272228A | 1986-12-02 |
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
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