Title:
CHIP-SCALE ATOMIC BEAM GENERATING SYSTEMS
Document Type and Number:
WIPO Patent Application WO/2024/050153
Kind Code:
A3
Abstract:
An exemplary embodiment of the present disclosure provides a chip-scale atomic beam system comprising an atomic vapor source, a plurality of channels, and a propagation chamber. The atomic vapor source chamber can comprise an atomic vapor source configured to emit an atomic vapor. The plurality of channels can have first ends and second ends. The first ends can be in fluid communication with the atomic vapor source chamber. The plurality of channels can be configured to collimate the atomic vapor as it moves through the plurality of channels from the first ends to the second ends. The propagation chamber can be in fluid communication with the second ends of the plurality of channels. The propagation chamber can have an internal pressure less than an internal pressure of the atomic vapor source chamber to enable the collimated atomic vapor to propagate through the propagation chamber.
Inventors:
RAMAN CHANDRA (US)
DONLEY ELIZABETH (US)
KITCHING JOHN (US)
LI CHAO (US)
MARTINEZ GABRIELA (US)
MCGEHEE WILLIAM (US)
DONLEY ELIZABETH (US)
KITCHING JOHN (US)
LI CHAO (US)
MARTINEZ GABRIELA (US)
MCGEHEE WILLIAM (US)
Application Number:
PCT/US2023/061143
Publication Date:
April 11, 2024
Filing Date:
January 24, 2023
Export Citation:
Assignee:
GEORGIA TECH RES INST (US)
NATIONAL INSTITUTE OF STANDARDS AND TECH (US)
NATIONAL INSTITUTE OF STANDARDS AND TECH (US)
International Classes:
G01B9/02015; G04F5/14; G21K1/02; H03B17/00; H03L7/26; H05H3/02
Attorney, Agent or Firm:
SCHNEIDER, Ryan A. et al. (US)
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