CHLOROPRENE BLOCK COPOLYMER AND SOAPLESS POLYCHLOROPRENE LATEX, AND PROCESSES FOR PRODUCTION OF COPOLYMER AND LATEX

WIPO Patent Application WO/2007/007681

A1

Disclosed are a novel polychloroprene copolymer, a soapless polychloroprene latex, and a process for producing the copolymer or latex in a simple manner, which are intended to be used for the improvement in adhesion property and water resistance of a conventional polychloroprene adhesive or the improvement in oil resistance and adhesion property of a conventional styrene-butadiene block copolymer. A chloroprene block copolymer comprising a polymer (A) having the composition represented by the general formula (1) in the description and a chloroprene polymer (B), the polymer (A) being linked to one terminal or both termini of the chloroprene polymer (B), and the total amount of the 1,2-bond and the isomerized 1,2-bond in the chloroprene polymer (B) as measured by carbon-13 nuclear magnetic resonance spectrometry being 2.0 mol% or less; a soapless polychloroprene latex comprising an amphiphilic chloroprene copolymer having a hydrophobic chloroprene polymer and a hydrophilic oligomer or polymer having an acidic functional group attached to the hydrophobic chloroprene polymer and 2 wt% or less of an emulsifying agent; and a process for producing the chloroprene block copolymer or soapless polychloroprene latex.

OZOE SHINJI

PCT/JP2006/313598

January 18, 2007

July 07, 2006

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TOSOH CORP (JP)
OZOE SHINJI

C08F293/00; C08F2/38; C08F289/00; C08L53/00; C09J153/00

JP2004530751A	2004-10-07
JP2005513252A	2005-05-12
JPH02300217A	1990-12-12
JPH03212414A	1991-09-18
JPH03207710A	1991-09-11
JPS5889602A	1983-05-28
JP2000515181A	2000-11-14

OGURI, Shohei et al. (7-13 Nishi-Shimbashi 1-chom, Minato-ku Tokyo 03, JP)

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