Title:
CLEANING COMPOSITION, AND METHOD FOR CLEANING SUBSTRATE USING SAME
Document Type and Number:
WIPO Patent Application WO/2024/063465
Kind Code:
A1
Abstract:
The present invention relates to a cleaning composition comprising a solvent, a surfactant, and an oxidizing agent. The oxidizing agent included in the cleaning composition of the present invention oxidizes at least a portion of surfaces of a carbon-containing film and contaminants derived therefrom, thereby forming hydrophilic bonds including oxygen, and consequently weakens hydrophobic-hydrophobic bonds between the film and contaminants and reduces the viscosity of the composition, thus having the effects of improving the flow of a cleaning process and enhancing cleaning efficiency. In addition, the surfactant included in the cleaning composition of the present invention can form strong hydrophobic bonds with other portions of the surfaces of the carbon-containing film and contaminants derived therefrom to impart repellence between the film and contaminants, and thus has the effect of increasing cleaning efficiency.
Inventors:
PAIK UN GYU (KR)
SONG TAE SEUP (KR)
LEE GANG GYU (KR)
SONG TAE SEUP (KR)
LEE GANG GYU (KR)
Application Number:
PCT/KR2023/014013
Publication Date:
March 28, 2024
Filing Date:
September 18, 2023
Export Citation:
Assignee:
IUCF HYU (KR)
International Classes:
C11D3/39; C11D3/43; H01L21/02; H01L21/321
Foreign References:
| KR20140139498A | 2014-12-05 | |||
| US20090056744A1 | 2009-03-05 | |||
| KR20040007876A | 2004-01-28 | |||
| KR20220041717A | 2022-04-01 | |||
| KR20060042738A | 2006-05-15 |
Attorney, Agent or Firm:
E-SANG PATENT & TRADEMARK LAW FIRM (KR)
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