Title:
CLEANING COMPOSITION FOR REMOVING RESIST
Document Type and Number:
WIPO Patent Application WO/2009/006783
Kind Code:
A1
Abstract:
A cleaning composition for removing resist includes quaternary ammonium hydroxide, water,
alkyl glycol aryl ether, dimethylsulfoxide and corrosion inhibitor of polyacrylic
acid. The alkyl glycol of alkyl glycol aryl ether has 3-18 carbon atoms. The cleaning
composition for removing resist may clean the resist on a metal, metal alloy or
dielectric substrate and other residues, and has low etch rate for metals such
as Al and Cu, and nonmetals such as SiO2.
Inventors:
SHI ROBERT YONGTAO (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
LIU BING (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
LIU BING (CN)
Application Number:
PCT/CN2008/001258
Publication Date:
January 15, 2009
Filing Date:
July 01, 2008
Export Citation:
Assignee:
ANJI MICROELECTRONICS SHANGHAI (CN)
SHI ROBERT YONGTAO (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
LIU BING (CN)
SHI ROBERT YONGTAO (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
LIU BING (CN)
International Classes:
G03F7/42; H01L21/02; C11D1/83; C23G1/06
Foreign References:
| CN1715389A | 2006-01-04 | |||
| CN1982426A | 2007-06-20 | |||
| US6440856B1 | 2002-08-27 |
Attorney, Agent or Firm:
ZHENGHAN LAW FIRM (South Tower of Shanghai Stock Exchange BuildingN° 528 Pu Dong Road, Shanghai 0, CN)
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