Title:
CLEANING COMPOSITION FOR REMOVING RESIST
Document Type and Number:
WIPO Patent Application WO/2009/046637
Kind Code:
A1
Abstract:
A cleaning composition for removing resist includes quaternary ammonium hydroxide, water, alkyl glycol aryl ether, dimethylsulfoxide, poly carboxylic acid corrosion inhibitor and amino azole corrosion inhibitor. The cleaning composition may clean resist and other residues from metal, metal alloy and dielectric substrate, and has low etch rate for metal, such as Al and Cu and the like, and nonmetal, such as silicon dioxide and the like, as well as suppress generation of oxide on the surface of the metal.
Inventors:
SHI ROBERT YONGTAO (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
Application Number:
PCT/CN2008/001693
Publication Date:
April 16, 2009
Filing Date:
October 06, 2008
Export Citation:
Assignee:
ANJI MICROELECTRONICS SHANGHAI (CN)
SHI ROBERT YONGTAO (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
SHI ROBERT YONGTAO (CN)
PENG LIBBERT HONGXIU (CN)
CAO JENNY HUIYING (CN)
International Classes:
G03F7/42; H01L21/02; C11D1/83; C23G1/06
Foreign References:
| CN1715389A | 2006-01-04 | |||
| CN1982426A | 2007-06-20 | |||
| US6068000A | 2000-05-30 |
Attorney, Agent or Firm:
HANHONG LAW FIRM (New Huang Pu Financial BuildingNo. 61 East Nanjing Road, Shanghai 2, CN)
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