Title:
CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/155540
Kind Code:
A1
Abstract:
In this invention, a charged-particle beam device (110) comprises: a lens barrel (111) having a charged particle source (112); a sample chamber (101) for mounting therein a sample to be irradiated by a charged-particle beam; and a thermionic emission type electron source (102) disposed in the sample chamber (101) and maintained at a lower electrical potential than that of the sample chamber inner walls. A voltage is applied to an electron source power source (103) thereby generating a heating current and causing electrons (e-) to be released from the thermionic emission type electron source (102), whereby the interior of the sample chamber (101) is cleaned. A negative voltage is applied to the thermionic emission type electron source (102) by a bias power source (104), thereby maintaining the thermionic emission type electron source (102) at a lower electric potential than that of the sample chamber (101) inner walls. The magnitude of the negative voltage applied to the thermionic emission type electron source (102) is preferably 30 to 1,000 V, and on the order of 60 to 120 V is particularly preferable.
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Inventors:
SATO RYUJU (JP)
DAVID HOYLE (CA)
DAVID HOYLE (CA)
Application Number:
PCT/JP2018/004154
Publication Date:
August 15, 2019
Filing Date:
February 07, 2018
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
HITACHI HIGH TECH CANADA INC (CA)
HITACHI HIGH TECH CANADA INC (CA)
International Classes:
H01J37/16; H01J1/13
Domestic Patent References:
| WO2015053300A1 | 2015-04-16 |
Foreign References:
| JP2000149844A | 2000-05-30 | |||
| JP2012099312A | 2012-05-24 | |||
| JPH06267492A | 1994-09-22 | |||
| JPS4716574A |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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