Title:
CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2008/069211
Kind Code:
A1
Abstract:
In an exposure apparatus, a substrate is exposed to an exposure beam through an exposure
liquid. A cleaning liquid is supplied to the exposure apparatus for cleaning
at least a part of the exposure apparatus. In the cleaning liquid, a prescribed
gas is dissolved at a saturating concentration or more.
Inventors:
NAGASAKA HIROYUKI (JP)
MORITA HIROSHI (JP)
TOKOSHIMA HIROTO (JP)
MORITA HIROSHI (JP)
TOKOSHIMA HIROTO (JP)
Application Number:
PCT/JP2007/073414
Publication Date:
June 12, 2008
Filing Date:
December 04, 2007
Export Citation:
Assignee:
NIKON CORP (JP)
KURITA WATER IND LTD (JP)
NAGASAKA HIROYUKI (JP)
MORITA HIROSHI (JP)
TOKOSHIMA HIROTO (JP)
KURITA WATER IND LTD (JP)
NAGASAKA HIROYUKI (JP)
MORITA HIROSHI (JP)
TOKOSHIMA HIROTO (JP)
International Classes:
H01L21/027; B01F23/00; G03F7/20
Foreign References:
| JP2006179909A | 2006-07-06 | |||
| JP2006223995A | 2006-08-31 | |||
| JP2005079222A | 2005-03-24 | |||
| JP2006190997A | 2006-07-20 |
Attorney, Agent or Firm:
SHIGA, Masatake et al. (MarunouchiChiyoda-ku, Tokyo 20, JP)
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