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Title:
CLEANING MACHINE AND CLEANING METHOD FOR PHOTOMASK PELLICLE
Document Type and Number:
WIPO Patent Application WO/2023/000459
Kind Code:
A1
Abstract:
Embodiments of the present application provide a cleaning machine and cleaning method for a photomask pellicle. The cleaning machine at least comprises an air knife and a cleaning device. The air knife is used for blowing contamination particles off of the surface of a photomask pellicle. The cleaning device is used for spraying a cleaning liquid on the surface of the photomask pellicle, so as to, by means of the volatilization of the cleaning liquid, erode contamination particles that were not blown off by the air knife. The air knife is also used for blowing off eroded contamination particles.

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Inventors:
SUN FEI (CN)
Application Number:
PCT/CN2021/117030
Publication Date:
January 26, 2023
Filing Date:
September 07, 2021
Export Citation:
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Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F7/20; B08B5/02
Foreign References:
CN110052450A2019-07-26
CN112864050A2021-05-28
CN208076854U2018-11-09
TW200809943A2008-02-16
US20210200107A12021-07-01
CN202189222U2012-04-11
CN109248878A2019-01-22
CN101063806A2007-10-31
CN102427047A2012-04-25
CN109212793A2019-01-15
JPH07256222A1995-10-09
Attorney, Agent or Firm:
CHINA PAT INTELLECTUAL PROPERTY OFFICE (CN)
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