Title:
CLEANING METHOD, CLEANING LIQUID, AND CLEANING AGENT FOR EXHAUST GAS TREATMENT FACILITY
Document Type and Number:
WIPO Patent Application WO/2023/189306
Kind Code:
A1
Abstract:
This exhaust gas treatment facility comprises: a combustion chamber 1 for combusting wastewater; a nozzle for causing water to flow along the inner wall surface of the combustion chamber 1; a water supply line for supplying water to the nozzle; a primary smoke washing chamber 11; and a scrubber 20. When solids of the scrubber 20 are removed, an aqueous alkaline detergent solution is injected from a chemical injection device 50 into a lower water tank 44 to set the pH value to 8-14. The inside of the scrubber 20 is cleaned by operating a circulation pump 23 and sprinkling water from the nozzle 21. The cleaning solution having a pH of 8 to 14 may be sprinkled from above a mist catcher 40.
Inventors:
HARASHIMA SHINGO (JP)
Application Number:
PCT/JP2023/008698
Publication Date:
October 05, 2023
Filing Date:
March 08, 2023
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
International Classes:
B01D53/68; B01D53/78; F23G7/06; F23J15/04
Domestic Patent References:
WO2008072392A1 | 2008-06-19 | |||
WO2022092086A1 | 2022-05-05 |
Foreign References:
JP2001149755A | 2001-06-05 | |||
JP2006150280A | 2006-06-15 | |||
JPS6359337A | 1988-03-15 | |||
JPH0938463A | 1997-02-10 | |||
JPH0557246A | 1993-03-09 | |||
JPH09192446A | 1997-07-29 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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