Title:
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/033568
Kind Code:
A1
Abstract:
The cleaning method according to a mode of the present disclosure has: a step for supplying a halogen-containing gas that does not contain fluorine to the interior of a processing container that can be exhausted via an exhaust pipe to perform cleaning; and, after the step for supplying the halogen-containing gas to perform cleaning, a step for supplying a fluorine-containing gas to at least one of the interior of the processing container and the interior of the exhaust pipe to perform cleaning.
Inventors:
TAKEZAWA YOSHIHIRO (JP)
SUZUKI DAISUKE (JP)
HAYASHI HIROYUKI (JP)
MIYAHARA TATSUYA (JP)
FUJITA KEISUKE (JP)
OIKAWA MASAMI (JP)
FUJITA SENA (JP)
SUZUKI DAISUKE (JP)
HAYASHI HIROYUKI (JP)
MIYAHARA TATSUYA (JP)
FUJITA KEISUKE (JP)
OIKAWA MASAMI (JP)
FUJITA SENA (JP)
Application Number:
PCT/JP2020/030214
Publication Date:
February 25, 2021
Filing Date:
August 06, 2020
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/205; C23C16/42; C23C16/44; H01L21/31
Foreign References:
| JP2007150213A | 2007-06-14 | |||
| JP2009076590A | 2009-04-09 | |||
| JP2019091763A | 2019-06-13 | |||
| JP2007141895A | 2007-06-07 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
Download PDF: