Title:
CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2007/049462
Kind Code:
A1
Abstract:
A transfer member provided with a cleaning function, which has excellent foreign material
removing performance and transfer performance and removes foreign materials
having a prescribed particle diameter with especially high efficiency. The
transfer member is provided with a transfer member (50) and a cleaning layer (20)
arranged at least on one surface of the transfer member. The cleaning layer has
an uneven shape having an arithmetic average roughness (Ra) of 0.05μm or
less and a maximum height (Rz) of 1.0μm or less. Preferably, a substantial surface
area of the cleaning layer per a flat surface of 1mm2 is 150% of a substantial
surface area of a silicon wafer mirror surface per a flat surface of 1mm2.
Inventors:
UENDA DAISUKE (JP)
ARIMITSU YUKIO (JP)
TERADA YOSHIO (JP)
AMANO YASUHIRO (JP)
MURATA AKIHISA (JP)
ARIMITSU YUKIO (JP)
TERADA YOSHIO (JP)
AMANO YASUHIRO (JP)
MURATA AKIHISA (JP)
Application Number:
PCT/JP2006/320366
Publication Date:
May 03, 2007
Filing Date:
October 12, 2006
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
UENDA DAISUKE (JP)
ARIMITSU YUKIO (JP)
TERADA YOSHIO (JP)
AMANO YASUHIRO (JP)
MURATA AKIHISA (JP)
UENDA DAISUKE (JP)
ARIMITSU YUKIO (JP)
TERADA YOSHIO (JP)
AMANO YASUHIRO (JP)
MURATA AKIHISA (JP)
International Classes:
H01L21/304; A47L25/00; B08B1/00
Foreign References:
| JP2005052784A | 2005-03-03 | |||
| JP2005218968A | 2005-08-18 | |||
| JP2005270553A | 2005-10-06 | |||
| JP2005032971A | 2005-02-03 | |||
| JP2001112703A | 2001-04-24 | |||
| JPS61180665U | 1986-11-11 |
Other References:
See also references of EP 1942519A4
None
None
Attorney, Agent or Firm:
MOMII, Takafumi (Chiyoda Building Bekkan 6-1-2, Nishitemma, Kita-k, Osaka-shi Osaka, JP)
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