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Patent Searching and Data


Title:
COATING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2000/058409
Kind Code:
A1
Abstract:
A coating composition comprising either a silane compound represented by the general formula (1) Si¿n?X?1¿¿n? or a modified silane compound represented by the general formula (2) Si¿n?X?2¿¿m?Y¿l? and a solvent for the compound. In said formula (1) X?1¿ is hydrogen or halogeno; and n is an integer of 4 or above, provided nX?1¿s may be the same or different from each other, and in said formula (2) X?2¿ is hydrogen or halogeno; Y is boron or phosphorus; n is an integer of 3 or above; l is an integer of 1 or above; and m is an integer of n to 2n+3, provided mX?2¿s may be the same or different from each other. This composition is suitable for the production of devices involving the deposition of silicon films or boron- or phosphorus-doped silicon films on large-area substrates.

Inventors:
MATSUKI YASUO (JP)
Application Number:
PCT/JP2000/001960
Publication Date:
October 05, 2000
Filing Date:
March 29, 2000
Export Citation:
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Assignee:
JSR CORP (JP)
MATSUKI YASUO (JP)
International Classes:
C01B33/04; C01B33/08; C08G77/60; C08L1/00; C09D1/00; C09D183/00; C09D183/16; C23C18/12; H01L21/205; H01L21/28; H01L21/288; (IPC1-7): C09D1/00
Foreign References:
JPH02251135A1990-10-08
JPH02266525A1990-10-31
JPH02101463A1990-04-13
EP0233613A21987-08-26
US3379512A1968-04-23
US4695331A1987-09-22
Other References:
DAHN J.R. ET AL.: "x-ray diffraction and absorption studies of porous silicon, siloxene, heat treated siloxene and layered polysilane", J. APPL. PHYS.,, vol. 75, no. 4, 1994, pages 1946 - 1951, XP002929061
KOCH W. ET AL.: "The valence isomers of (ch9s and (SiH)s : AN Ab initio MO Study", J. COMPUT. CHEM.,, vol. 15, no. 10, 1994, pages 1151 - 1162, XP002929062
See also references of EP 1092755A4
Attorney, Agent or Firm:
Ohshima, Masataka (Yotsuya 4-chome Shinjuku-ku Tokyo, JP)
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