COATING FILM FORMING COMPOSITION AND SUBSTRATE MANUFACTURING METHOD

Title:

COATING FILM FORMING COMPOSITION AND SUBSTRATE MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2020/138121

Kind Code:

A1

Abstract:

The purpose of the present invention is to provide a coating film forming composition having excellent storage stability and a method for producing a substrate. The present invention provides a coating film-forming composition including a cobalt-containing compound having no cobalt-carbon bond and a solvent.

Inventors:

OOTSUBO YUUSUKE (JP)
SAKAI TATSUYA (JP)
SAKAI KAZUNORI (JP)

Application Number:

PCT/JP2019/050710

Publication Date:

July 02, 2020

Filing Date:

December 24, 2019

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Assignee:

JSR CORP (JP)

International Classes:

C09D7/20; C09D1/00; C23C26/00

Foreign References:

JP2002541274A

2002-12-03

Attorney, Agent or Firm:

AMANO Kazunori (JP)

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